DOI: 10.1021/cm00018a005. Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation

Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation

10.1021/cm00018a005

Crossref journal-article

American Chemical Society (ACS)

Chemistry of Materials (316)

Bibliography

Jain, A., Chi, K. M., Kodas, T. T., Hampden-Smith, M. J., Farr, J. D., & Paffett, M. F. (1991). Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation. Chemistry of Materials, 3(6), 995â997.

Authors 6

A. Jain (first)
K. M. Chi (additional)
T. T. Kodas (additional)
M. J. Hampden-Smith (additional)
J. D. Farr (additional)
M. F. Paffett (additional)

References 0 Referenced 99

None

Dates

Type	When
Created	20 years, 5 months ago (March 8, 2005, 7:19 a.m.)
Deposited	2 years, 5 months ago (March 22, 2023, 4:39 a.m.)
Indexed	1 year, 1 month ago (July 13, 2024, 8:09 p.m.)
Issued	33 years, 10 months ago (Nov. 1, 1991)
Published	33 years, 10 months ago (Nov. 1, 1991)
Published Online	23 years, 4 months ago (May 1, 2002)
Published Print	33 years, 10 months ago (Nov. 1, 1991)

Funders 0

None

BibTeX

@article{Jain_1991, title={Chemical vapor deposition of copper from (hexafluoroacetylacetonato)(alkyne)copper(I) complexes via disproportionation}, volume={3}, ISSN={1520-5002}, url={http://dx.doi.org/10.1021/cm00018a005}, DOI={10.1021/cm00018a005}, number={6}, journal={Chemistry of Materials}, publisher={American Chemical Society (ACS)}, author={Jain, A. and Chi, K. M. and Kodas, T. T. and Hampden-Smith, M. J. and Farr, J. D. and Paffett, M. F.}, year={1991}, month=nov, pages={995–997} }

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