Crossref
journal-article
American Chemical Society (ACS)
ACS Applied Materials & Interfaces (316)
References
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Dates
Type | When |
---|---|
Created | 11 years, 1 month ago (July 15, 2014, 4:36 p.m.) |
Deposited | 2 years, 4 months ago (April 15, 2023, 12:05 a.m.) |
Indexed | 1 month, 1 week ago (July 16, 2025, 7:46 a.m.) |
Issued | 11 years, 1 month ago (July 21, 2014) |
Published | 11 years, 1 month ago (July 21, 2014) |
Published Online | 11 years, 1 month ago (July 21, 2014) |
Published Print | 11 years ago (Aug. 13, 2014) |
Funders
2
LEAST
National Institute of Standards and Technology
10.13039/100000161
Region: Americas
gov (National government)
Labels
4
- U.S. National Institute of Standards and Technology
- National Institute for Standards and Technology
- U.S. Department of Commerce's National Institute of Standards and Technology
- NIST
@article{Cheng_2014, title={Atomic Layer Deposition of a High-k Dielectric on MoS2 Using Trimethylaluminum and Ozone}, volume={6}, ISSN={1944-8252}, url={http://dx.doi.org/10.1021/am5032105}, DOI={10.1021/am5032105}, number={15}, journal={ACS Applied Materials & Interfaces}, publisher={American Chemical Society (ACS)}, author={Cheng, Lanxia and Qin, Xiaoye and Lucero, Antonio T. and Azcatl, Angelica and Huang, Jie and Wallace, Robert M. and Cho, Kyeongjae and Kim, Jiyoung}, year={2014}, month=jul, pages={11834–11838} }