DOI: 10.1017/s1431927611004624. Atom Probe Tomography Analysis of Thick Film SiO<sub>2</sub> and Oxide Interfaces: Conditions Leading to Improved Analysis Yield

Atom Probe Tomography Analysis of Thick Film SiO2 and Oxide Interfaces: Conditions Leading to Improved Analysis Yield

10.1017/s1431927611004624

Crossref journal-article

Oxford University Press (OUP)

Microscopy and Microanalysis (286)

Abstract

Extended abstract of a paper presented at Microscopy and Microanalysis 2011 in Nashville, Tennessee, USA, August 7–August 11, 2011.

Bibliography

Prosa, T., Lawrence, D., Olson, D., Lenz, D., Bunton, J., & Larson, D. (2011). Atom Probe Tomography Analysis of Thick Film SiO2 and Oxide Interfaces: Conditions Leading to Improved Analysis Yield. Microscopy and Microanalysis, 17(S2), 750â751.

Authors 6

T Prosa (first)
D Lawrence (additional)
D Olson (additional)
D Lenz (additional)
J Bunton (additional)
D Larson (additional)

References 0 Referenced 3

None

Dates

Type	When
Created	13 years, 10 months ago (Oct. 7, 2011, 4:17 p.m.)
Deposited	2 years, 6 months ago (Feb. 14, 2023, 3:49 p.m.)
Indexed	2 years, 4 months ago (April 21, 2023, 11:29 a.m.)
Issued	14 years, 1 month ago (July 1, 2011)
Published	14 years, 1 month ago (July 1, 2011)
Published Online	8 years, 4 months ago (April 8, 2017)
Published Print	14 years, 1 month ago (July 1, 2011)

Funders 0

None

BibTeX

@article{Prosa_2011, title={Atom Probe Tomography Analysis of Thick Film SiO2 and Oxide Interfaces: Conditions Leading to Improved Analysis Yield}, volume={17}, ISSN={1435-8115}, url={http://dx.doi.org/10.1017/s1431927611004624}, DOI={10.1017/s1431927611004624}, number={S2}, journal={Microscopy and Microanalysis}, publisher={Oxford University Press (OUP)}, author={Prosa, T and Lawrence, D and Olson, D and Lenz, D and Bunton, J and Larson, D}, year={2011}, month=jul, pages={750–751} }

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