DOI: 10.1017/s1431927602101577. FIB Damage in Silicon: Amorphization or Redeposition?

FIB Damage in Silicon: Amorphization or Redeposition?

10.1017/s1431927602101577

Crossref journal-article

Oxford University Press (OUP)

Microscopy and Microanalysis (286)

Bibliography

Rajsiri, S., Kempshall, B. W., Schwarz, S. M., & Giannuzzi, L. A. (2002). FIB Damage in Silicon: Amorphization or Redeposition? Microscopy and Microanalysis, 8(S02), 50â51.

Authors 4

S. Rajsiri (first)
B. W. Kempshall (additional)
S.M. Schwarz (additional)
L. A. Giannuzzi (additional)

References 0 Referenced 30

None

Dates

Type	When
Created	6 years, 3 months ago (May 6, 2019, 8:55 p.m.)
Deposited	2 years, 6 months ago (Feb. 14, 2023, 4:04 p.m.)
Indexed	3 months, 2 weeks ago (May 6, 2025, 5:52 a.m.)
Issued	23 years ago (Aug. 1, 2002)
Published	23 years ago (Aug. 1, 2002)
Published Online	22 years, 9 months ago (Nov. 1, 2002)
Published Print	23 years ago (Aug. 1, 2002)

Funders 0

None

BibTeX

@article{Rajsiri_2002, title={FIB Damage in Silicon: Amorphization or Redeposition?}, volume={8}, ISSN={1435-8115}, url={http://dx.doi.org/10.1017/s1431927602101577}, DOI={10.1017/s1431927602101577}, number={S02}, journal={Microscopy and Microanalysis}, publisher={Oxford University Press (OUP)}, author={Rajsiri, S. and Kempshall, B. W. and Schwarz, S.M. and Giannuzzi, L. A.}, year={2002}, month=aug, pages={50–51} }

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