Crossref
journal-article
Elsevier BV
Ultramicroscopy (78)
References
8
Referenced
17
10.1063/1.327686
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/ Microsc. Microanal. by Kelly (2004)- International Technology Roadmap for Semiconductors: Front End Processes, 2005, p. 37.
10.1016/j.ultramic.2004.10.011
/ Ultramicroscopy by Miller (2005)10.1016/j.ultramic.2006.06.008
/ Ultramicroscopy by Thompson (2007)10.1016/S0927-0256(98)00020-2
/ Comput. Mater. Sci. by Law (1998)10.1109/IEDM.2002.1175976
/ IEDM Tech. Digest by Kennel (2002){'key': '10.1016/j.ultramic.2007.08.008_bib8', 'series-title': 'Atom Probe Field Ion Microscopy', 'author': 'Miller', 'year': '1996'}
/ Atom Probe Field Ion Microscopy by Miller (1996)
Dates
Type | When |
---|---|
Created | 17 years, 11 months ago (Aug. 31, 2007, 3:14 a.m.) |
Deposited | 6 years, 7 months ago (Jan. 4, 2019, 11:51 a.m.) |
Indexed | 1 year, 4 months ago (April 1, 2024, 1:21 p.m.) |
Issued | 17 years, 3 months ago (May 1, 2008) |
Published | 17 years, 3 months ago (May 1, 2008) |
Published Print | 17 years, 3 months ago (May 1, 2008) |
@article{Moore_2008, title={3-D analysis of semiconductor dopant distributions in a patterned structure using LEAP}, volume={108}, ISSN={0304-3991}, url={http://dx.doi.org/10.1016/j.ultramic.2007.08.008}, DOI={10.1016/j.ultramic.2007.08.008}, number={6}, journal={Ultramicroscopy}, publisher={Elsevier BV}, author={Moore, J.S. and Jones, K.S. and Kennel, H. and Corcoran, S.}, year={2008}, month=may, pages={536–539} }