DOI: 10.1016/j.tsf.2009.06.027. Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W–S

Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W–S–C film

10.1016/j.tsf.2009.06.027

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Koch, T., Evaristo, M., Pauschitz, A., Roy, M., & Cavaleiro, A. (2009). Nanoindentation and nanoscratch behaviour of reactive sputtered deposited WâSâC film. Thin Solid Films, 518(1), 185â193.

Authors 5

T. Koch (first)
M. Evaristo (additional)
A. Pauschitz (additional)
Manish Roy (additional)
A. Cavaleiro (additional)

References 44 Referenced 33

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Dates

Type	When
Created	16 years, 2 months ago (June 24, 2009, 6 a.m.)
Deposited	6 years, 8 months ago (Dec. 18, 2018, 11:51 a.m.)
Indexed	3 months, 1 week ago (May 21, 2025, 1:07 p.m.)
Issued	15 years, 9 months ago (Nov. 1, 2009)
Published	15 years, 9 months ago (Nov. 1, 2009)
Published Print	15 years, 9 months ago (Nov. 1, 2009)

Funders 0

None

BibTeX

@article{Koch_2009, title={Nanoindentation and nanoscratch behaviour of reactive sputtered deposited W–S–C film}, volume={518}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/j.tsf.2009.06.027}, DOI={10.1016/j.tsf.2009.06.027}, number={1}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Koch, T. and Evaristo, M. and Pauschitz, A. and Roy, Manish and Cavaleiro, A.}, year={2009}, month=nov, pages={185–193} }

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