DOI: 10.1016/j.tsf.2007.06.142. Structure and properties of reactively-sputtered AlxCoCrCuFeNi oxide films

Structure and properties of reactively-sputtered AlxCoCrCuFeNi oxide films

10.1016/j.tsf.2007.06.142

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Chen, T.-K., & Wong, M.-S. (2007). Structure and properties of reactively-sputtered AlxCoCrCuFeNi oxide films. Thin Solid Films, 516(2â4), 141â146.

Authors 2

Ta-Kun Chen (first)
Ming-Show Wong (additional)

References 37 Referenced 35

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Dates

Type	When
Created	18 years, 2 months ago (June 23, 2007, 3:08 a.m.)
Deposited	6 years, 7 months ago (Jan. 6, 2019, 3:21 a.m.)
Indexed	1 week, 2 days ago (Aug. 23, 2025, 1:03 a.m.)
Issued	17 years, 9 months ago (Dec. 1, 2007)
Published	17 years, 9 months ago (Dec. 1, 2007)
Published Print	17 years, 9 months ago (Dec. 1, 2007)

Funders 0

None

BibTeX

@article{Chen_2007, title={Structure and properties of reactively-sputtered AlxCoCrCuFeNi oxide films}, volume={516}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/j.tsf.2007.06.142}, DOI={10.1016/j.tsf.2007.06.142}, number={2–4}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Chen, Ta-Kun and Wong, Ming-Show}, year={2007}, month=dec, pages={141–146} }

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