DOI: 10.1016/j.tsf.2005.05.050. Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water

10.1016/j.tsf.2005.05.050

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Kukli, K., Pilvi, T., Ritala, M., Sajavaara, T., Lu, J., & LeskelÃ¤, M. (2005). Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water. Thin Solid Films, 491(1â2), 328â338.

Authors 6

Kaupo Kukli (first)
Tero Pilvi (additional)
Mikko Ritala (additional)
Timo Sajavaara (additional)
Jun Lu (additional)
Markku Leskelä (additional)

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Dates

Type	When
Created	20 years, 1 month ago (July 15, 2005, 9:34 a.m.)
Deposited	6 years, 7 months ago (Jan. 24, 2019, 8:54 a.m.)
Indexed	2 months ago (June 29, 2025, 11:02 a.m.)
Issued	19 years, 9 months ago (Nov. 1, 2005)
Published	19 years, 9 months ago (Nov. 1, 2005)
Published Print	19 years, 9 months ago (Nov. 1, 2005)

Funders 0

None

BibTeX

@article{Kukli_2005, title={Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water}, volume={491}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/j.tsf.2005.05.050}, DOI={10.1016/j.tsf.2005.05.050}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Kukli, Kaupo and Pilvi, Tero and Ritala, Mikko and Sajavaara, Timo and Lu, Jun and Leskelä, Markku}, year={2005}, month=nov, pages={328–338} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        29
      ]
    ],
    "date-time": "2025-06-29T15:02:20Z",
    "timestamp": 1751209340801
  },
  "reference-count": 53,
  "publisher": "Elsevier BV",
  "issue": "1-2",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2005,
            11,
            1
          ]
        ],
        "date-time": "2005-11-01T00:00:00Z",
        "timestamp": 1130803200000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://www.elsevier.com/tdm/userlicense/1.0/"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        2005,
        11
      ]
    ]
  },
  "DOI": "10.1016/j.tsf.2005.05.050",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2005,
        7,
        15
      ]
    ],
    "date-time": "2005-07-15T13:34:03Z",
    "timestamp": 1121434443000
  },
  "page": "328-338",
  "source": "Crossref",
  "is-referenced-by-count": 82,
  "title": "Atomic layer deposition of hafnium dioxide thin films from hafnium tetrakis(dimethylamide) and water",
  "prefix": "10.1016",
  "volume": "491",
  "author": [
    {
      "given": "Kaupo",
      "family": "Kukli",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Tero",
      "family": "Pilvi",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Mikko",
      "family": "Ritala",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Timo",
      "family": "Sajavaara",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Jun",
      "family": "Lu",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Markku",
      "family": "Leskel\u00e4",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "78",
  "reference": [
    {
      "key": "10.1016/j.tsf.2005.05.050_bib1",
      "doi-asserted-by": "crossref",
      "first-page": "72",
      "DOI": "10.1016/0040-6090(94)90168-6",
      "volume": "250",
      "author": "Ritala",
      "year": "1994",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib2",
      "doi-asserted-by": "crossref",
      "first-page": "73",
      "DOI": "10.1002/cvde.200390005",
      "volume": "9",
      "author": "Gordon",
      "year": "2003",
      "journal-title": "Chem. Vap. Depos."
    },
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      "key": "10.1016/j.tsf.2005.05.050_bib3",
      "doi-asserted-by": "crossref",
      "first-page": "2029",
      "DOI": "10.1116/1.1603286",
      "volume": "21",
      "author": "Kim",
      "year": "2003",
      "journal-title": "J. Vac. Sci. Technol. B"
    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib4",
      "doi-asserted-by": "crossref",
      "first-page": "820",
      "DOI": "10.1088/0268-1242/18/9/302",
      "volume": "18",
      "author": "Johansson",
      "year": "2003",
      "journal-title": "Semicond. Sci. Technol."
    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib5",
      "doi-asserted-by": "crossref",
      "first-page": "1",
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      "volume": "4",
      "author": "Biercuk",
      "year": "2004",
      "journal-title": "Nano Lett."
    },
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      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib42",
      "doi-asserted-by": "crossref",
      "first-page": "712",
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      "volume": "93",
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      "year": "2003",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib43",
      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib44",
      "doi-asserted-by": "crossref",
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      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib46",
      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib47",
      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib48",
      "doi-asserted-by": "crossref",
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    },
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    },
    {
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib51",
      "doi-asserted-by": "crossref",
      "first-page": "1801",
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      "year": "2001",
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    },
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      "doi-asserted-by": "crossref",
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    },
    {
      "key": "10.1016/j.tsf.2005.05.050_bib53",
      "doi-asserted-by": "crossref",
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      "journal-title": "J. Cryst. Growth"
    }
  ],
  "container-title": "Thin Solid Films",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0040609005005961?httpAccept=text/xml",
      "content-type": "text/xml",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0040609005005961?httpAccept=text/plain",
      "content-type": "text/plain",
      "content-version": "vor",
      "intended-application": "text-mining"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2019,
        1,
        24
      ]
    ],
    "date-time": "2019-01-24T13:54:20Z",
    "timestamp": 1548338060000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://linkinghub.elsevier.com/retrieve/pii/S0040609005005961"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2005,
        11
      ]
    ]
  },
  "references-count": 53,
  "journal-issue": {
    "issue": "1-2",
    "published-print": {
      "date-parts": [
        [
          2005,
          11
        ]
      ]
    }
  },
  "alternative-id": [
    "S0040609005005961"
  ],
  "URL": "http://dx.doi.org/10.1016/j.tsf.2005.05.050",
  "relation": {},
  "ISSN": [
    "0040-6090"
  ],
  "subject": [],
  "container-title-short": "Thin Solid Films",
  "published": {
    "date-parts": [
      [
        2005,
        11
      ]
    ]
  }
}