DOI: 10.1016/j.mssp.2015.04.045. Structure and characteristics of reactive magnetron sputtered (CrTaTiVZr)N coatings

Structure and characteristics of reactive magnetron sputtered (CrTaTiVZr)N coatings

10.1016/j.mssp.2015.04.045

Crossref journal-article

Elsevier BV

Materials Science in Semiconductor Processing (78)

Bibliography

Chang, Z.-C., Tsai, D.-C., & Chen, E.-C. (2015). Structure and characteristics of reactive magnetron sputtered (CrTaTiVZr)N coatings. Materials Science in Semiconductor Processing, 39, 30â39.

Authors 3

Zue-Chin Chang (first)
Du-Cheng Tsai (additional)
Erh-Chiang Chen (additional)

References 42 Referenced 25

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Dates

Type	When
Created	10 years, 3 months ago (May 14, 2015, 10:32 a.m.)
Deposited	6 years ago (Aug. 24, 2019, 7:18 p.m.)
Indexed	1 month ago (Aug. 2, 2025, 11:58 p.m.)
Issued	9 years, 10 months ago (Nov. 1, 2015)
Published	9 years, 10 months ago (Nov. 1, 2015)
Published Print	9 years, 10 months ago (Nov. 1, 2015)

Funders 1

Ministry of Science and Technology
Awards1
1. 103-2622-E-167-011-CC3

BibTeX

@article{Chang_2015, title={Structure and characteristics of reactive magnetron sputtered (CrTaTiVZr)N coatings}, volume={39}, ISSN={1369-8001}, url={http://dx.doi.org/10.1016/j.mssp.2015.04.045}, DOI={10.1016/j.mssp.2015.04.045}, journal={Materials Science in Semiconductor Processing}, publisher={Elsevier BV}, author={Chang, Zue-Chin and Tsai, Du-Cheng and Chen, Erh-Chiang}, year={2015}, month=nov, pages={30–39} }

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