DOI: 10.1016/j.mee.2007.01.239. Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode

10.1016/j.mee.2007.01.239

Crossref journal-article

Elsevier BV

Microelectronic Engineering (78)

Bibliography

Park, S.-J., Kim, W.-H., Lee, H.-B.-R., Maeng, W. J., & Kim, H. (2008). Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode. Microelectronic Engineering, 85(1), 39â44.

Authors 5

Sang-Joon Park (first)
Woo-Hee Kim (additional)
Han-Bo-Ram Lee (additional)
W.J. Maeng (additional)
H. Kim (additional)

References 34 Referenced 94

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Dates

Type	When
Created	18 years, 5 months ago (Feb. 27, 2007, 6:25 a.m.)
Deposited	6 years, 7 months ago (Jan. 8, 2019, 4:23 p.m.)
Indexed	2 months, 2 weeks ago (June 10, 2025, 10:27 a.m.)
Issued	17 years, 7 months ago (Jan. 1, 2008)
Published	17 years, 7 months ago (Jan. 1, 2008)
Published Print	17 years, 7 months ago (Jan. 1, 2008)

Funders 0

None

BibTeX

@article{Park_2008, title={Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode}, volume={85}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/j.mee.2007.01.239}, DOI={10.1016/j.mee.2007.01.239}, number={1}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Park, Sang-Joon and Kim, Woo-Hee and Lee, Han-Bo-Ram and Maeng, W.J. and Kim, H.}, year={2008}, month=jan, pages={39–44} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        10
      ]
    ],
    "date-time": "2025-06-10T14:27:28Z",
    "timestamp": 1749565648144
  },
  "reference-count": 34,
  "publisher": "Elsevier BV",
  "issue": "1",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2008,
            1,
            1
          ]
        ],
        "date-time": "2008-01-01T00:00:00Z",
        "timestamp": 1199145600000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://www.elsevier.com/tdm/userlicense/1.0/"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        2008,
        1
      ]
    ]
  },
  "DOI": "10.1016/j.mee.2007.01.239",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2007,
        2,
        27
      ]
    ],
    "date-time": "2007-02-27T11:25:57Z",
    "timestamp": 1172575557000
  },
  "page": "39-44",
  "source": "Crossref",
  "is-referenced-by-count": 94,
  "title": "Thermal and plasma enhanced atomic layer deposition ruthenium and electrical characterization as a metal electrode",
  "prefix": "10.1016",
  "volume": "85",
  "author": [
    {
      "given": "Sang-Joon",
      "family": "Park",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Woo-Hee",
      "family": "Kim",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Han-Bo-Ram",
      "family": "Lee",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "W.J.",
      "family": "Maeng",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "H.",
      "family": "Kim",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "78",
  "reference": [
    {
      "issue": "11",
      "key": "10.1016/j.mee.2007.01.239_bib1",
      "doi-asserted-by": "crossref",
      "first-page": "6852",
      "DOI": "10.1143/JJAP.41.6852",
      "volume": "41B",
      "author": "Choi",
      "year": "2002",
      "journal-title": "Jpn. J. Appl. Phys., Part 1"
    },
    {
      "issue": "3\u20134 Special issue",
      "key": "10.1016/j.mee.2007.01.239_bib2",
      "doi-asserted-by": "crossref",
      "first-page": "242",
      "DOI": "10.1016/j.mee.2005.07.030",
      "volume": "82",
      "author": "Manke",
      "year": "2005",
      "journal-title": "Microelectron. Eng."
    },
    {
      "issue": "4\u20136 Special issue",
      "key": "10.1016/j.mee.2007.01.239_bib3",
      "doi-asserted-by": "crossref",
      "first-page": "271",
      "DOI": "10.1016/j.mssp.2004.09.011",
      "volume": "7",
      "author": "\u0164apajna",
      "year": "2004",
      "journal-title": "Mater. Sci. Semiconductor Process."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib4",
      "doi-asserted-by": "crossref",
      "first-page": "043520",
      "DOI": "10.1063/1.2012510",
      "volume": "98",
      "author": "Wen",
      "year": "2005",
      "journal-title": "J. Appl. Phys."
    },
    {
      "issue": "1",
      "key": "10.1016/j.mee.2007.01.239_bib5",
      "doi-asserted-by": "crossref",
      "first-page": "C15",
      "DOI": "10.1149/1.1827595",
      "volume": "152",
      "author": "Kang",
      "year": "2005",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "issue": "1",
      "key": "10.1016/j.mee.2007.01.239_bib6",
      "doi-asserted-by": "crossref",
      "first-page": "C12",
      "DOI": "10.1149/1.1830398",
      "volume": "8",
      "author": "Kang",
      "year": "2005",
      "journal-title": "Electrochem. Solid-State Lett."
    },
    {
      "issue": "4",
      "key": "10.1016/j.mee.2007.01.239_bib7",
      "doi-asserted-by": "crossref",
      "first-page": "2094",
      "DOI": "10.1143/JJAP.39.2094",
      "volume": "39B",
      "author": "Kim",
      "year": "2000",
      "journal-title": "Jpn. J. Appl. Phys., Part 1"
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib8",
      "first-page": "263",
      "author": "Kim",
      "year": "2001",
      "journal-title": "IEDM Tech. Dig."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib9",
      "first-page": "789",
      "author": "Won",
      "year": "2000",
      "journal-title": "IEDM Tech. Dig."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib10",
      "doi-asserted-by": "crossref",
      "first-page": "2227",
      "DOI": "10.1109/TED.2005.856793",
      "volume": "52/10",
      "author": "Inoue",
      "year": "2005",
      "journal-title": "IEEE Trans. Electron Dev."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib11",
      "doi-asserted-by": "crossref",
      "first-page": "C107",
      "DOI": "10.1149/1.2200011",
      "volume": "9/7",
      "author": "Kawano",
      "year": "2006",
      "journal-title": "Electrochem. Solid State Lett."
    },
    {
      "issue": "10",
      "key": "10.1016/j.mee.2007.01.239_bib12",
      "doi-asserted-by": "crossref",
      "first-page": "3104",
      "DOI": "10.1016/j.surfcoat.2005.07.006",
      "volume": "200",
      "author": "Kim",
      "year": "2006",
      "journal-title": "Surf. Coat. Technol."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib13",
      "doi-asserted-by": "crossref",
      "first-page": "C19",
      "DOI": "10.1149/1.2138444",
      "volume": "9/1",
      "author": "Kim",
      "year": "2006",
      "journal-title": "Electrochem. Solid-State Lett."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib14",
      "doi-asserted-by": "crossref",
      "first-page": "C46",
      "DOI": "10.1149/1.1648612",
      "volume": "7/4",
      "author": "Kwon",
      "year": "2004",
      "journal-title": "Electrochem. Solid-State Lett."
    },
    {
      "issue": "10",
      "key": "10.1016/j.mee.2007.01.239_bib15",
      "doi-asserted-by": "crossref",
      "first-page": "2947",
      "DOI": "10.1557/JMR.2004.0372",
      "volume": "19",
      "author": "Papadatos",
      "year": "2004",
      "journal-title": "J. Mater. Res."
    },
    {
      "issue": "1",
      "key": "10.1016/j.mee.2007.01.239_bib16",
      "doi-asserted-by": "crossref",
      "first-page": "45",
      "DOI": "10.1002/cvde.200290007",
      "volume": "9",
      "author": "Aaltonen",
      "year": "2003",
      "journal-title": "Chem. Vap. Deposition"
    },
    {
      "issue": "4",
      "key": "10.1016/j.mee.2007.01.239_bib17",
      "doi-asserted-by": "crossref",
      "first-page": "215",
      "DOI": "10.1002/cvde.200306288",
      "volume": "10",
      "author": "Aaltonen",
      "year": "2004",
      "journal-title": "Chem. Vap. Deposition"
    },
    {
      "issue": "2",
      "key": "10.1016/j.mee.2007.01.239_bib18",
      "doi-asserted-by": "crossref",
      "first-page": "G109",
      "DOI": "10.1149/1.1640633",
      "volume": "151",
      "author": "Kwon",
      "year": "2004",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib19",
      "unstructured": "S.-J. Park, H.-B.-R. Lee, W.J. Maeng, Y.S. Yang, C.G. Park, H. Kim, J. Electrochem. Soc., submitted for publication."
    },
    {
      "issue": "6",
      "key": "10.1016/j.mee.2007.01.239_bib20",
      "doi-asserted-by": "crossref",
      "first-page": "G191",
      "DOI": "10.1149/1.2186427",
      "volume": "9",
      "author": "Maeng",
      "year": "2006",
      "journal-title": "Electrochem. Solid State Lett."
    },
    {
      "issue": "5",
      "key": "10.1016/j.mee.2007.01.239_bib21",
      "doi-asserted-by": "crossref",
      "first-page": "2276",
      "DOI": "10.1116/1.2345205",
      "volume": "24",
      "author": "Maeng",
      "year": "2006",
      "journal-title": "J. Vacuum Sci. Technol. B: Microelectron. Nanometer Struct."
    },
    {
      "issue": "12",
      "key": "10.1016/j.mee.2007.01.239_bib22",
      "doi-asserted-by": "crossref",
      "first-page": "C753",
      "DOI": "10.1149/1.1809576",
      "volume": "151",
      "author": "Kwon",
      "year": "2004",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "issue": "13",
      "key": "10.1016/j.mee.2007.01.239_bib23",
      "doi-asserted-by": "crossref",
      "first-page": "2433",
      "DOI": "10.1063/1.1509861",
      "volume": "81",
      "author": "Hiratani",
      "year": "2002",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "issue": "16",
      "key": "10.1016/j.mee.2007.01.239_bib24",
      "doi-asserted-by": "crossref",
      "first-page": "2370",
      "DOI": "10.1063/1.123854",
      "volume": "74",
      "author": "Lin",
      "year": "1999",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "issue": "11",
      "key": "10.1016/j.mee.2007.01.239_bib25",
      "doi-asserted-by": "crossref",
      "first-page": "6348",
      "DOI": "10.1143/JJAP.39.6348",
      "volume": "39",
      "author": "Aoyama",
      "year": "2000",
      "journal-title": "Jpn. J. Appl. Phys. Part 1"
    },
    {
      "issue": "9",
      "key": "10.1016/j.mee.2007.01.239_bib26",
      "doi-asserted-by": "crossref",
      "first-page": "1829",
      "DOI": "10.1109/16.784181",
      "volume": "46",
      "author": "Tsai",
      "year": "1999",
      "journal-title": "IEEE Trans. Electron Dev."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib27",
      "series-title": "Fundamentals of Surface and Thin Film Analysis",
      "author": "Feldman",
      "year": "1986"
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib28",
      "doi-asserted-by": "crossref",
      "first-page": "L203",
      "DOI": "10.1016/S0039-6028(00)01055-4",
      "volume": "474",
      "author": "Kim",
      "year": "2001",
      "journal-title": "Surf. Sci."
    },
    {
      "issue": "19",
      "key": "10.1016/j.mee.2007.01.239_bib29",
      "doi-asserted-by": "crossref",
      "first-page": "9482",
      "DOI": "10.1021/jp050560q",
      "volume": "109",
      "author": "Willocq",
      "year": "2005",
      "journal-title": "J. Phys. Chem. B"
    },
    {
      "issue": "1\u20133",
      "key": "10.1016/j.mee.2007.01.239_bib30",
      "doi-asserted-by": "crossref",
      "first-page": "81",
      "DOI": "10.1016/S0039-6028(99)01119-X",
      "volume": "447",
      "author": "Klaus",
      "year": "2000",
      "journal-title": "Surf. Sci."
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib31",
      "unstructured": "W.J. Maeng, J.W. Lee, J.M. Myung, H. Kim, Jpn. J. Appl. Phys., in press."
    },
    {
      "issue": "6546",
      "key": "10.1016/j.mee.2007.01.239_bib32",
      "doi-asserted-by": "crossref",
      "first-page": "215",
      "DOI": "10.1038/377215a0",
      "volume": "377",
      "author": "Cava",
      "year": "1995",
      "journal-title": "Nature"
    },
    {
      "key": "10.1016/j.mee.2007.01.239_bib33",
      "series-title": "MOS Physics and Technology",
      "author": "Nicollian",
      "year": "2003"
    },
    {
      "issue": "5",
      "key": "10.1016/j.mee.2007.01.239_bib34",
      "doi-asserted-by": "crossref",
      "first-page": "1",
      "DOI": "10.1063/1.1852079",
      "volume": "86",
      "author": "Park",
      "year": "2005",
      "journal-title": "Appl. Phys. Lett."
    }
  ],
  "container-title": "Microelectronic Engineering",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0167931707003061?httpAccept=text/xml",
      "content-type": "text/xml",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0167931707003061?httpAccept=text/plain",
      "content-type": "text/plain",
      "content-version": "vor",
      "intended-application": "text-mining"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2019,
        1,
        8
      ]
    ],
    "date-time": "2019-01-08T21:23:55Z",
    "timestamp": 1546982635000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://linkinghub.elsevier.com/retrieve/pii/S0167931707003061"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2008,
        1
      ]
    ]
  },
  "references-count": 34,
  "journal-issue": {
    "issue": "1",
    "published-print": {
      "date-parts": [
        [
          2008,
          1
        ]
      ]
    }
  },
  "alternative-id": [
    "S0167931707003061"
  ],
  "URL": "http://dx.doi.org/10.1016/j.mee.2007.01.239",
  "relation": {},
  "ISSN": [
    "0167-9317"
  ],
  "subject": [],
  "container-title-short": "Microelectronic Engineering",
  "published": {
    "date-parts": [
      [
        2008,
        1
      ]
    ]
  }
}