DOI: 10.1016/j.mee.2005.07.030. Atomic vapor deposition of Ru and RuO2 thin film layers for electrode applications

Atomic vapor deposition of Ru and RuO2 thin film layers for electrode applications

10.1016/j.mee.2005.07.030

Crossref journal-article

Elsevier BV

Microelectronic Engineering (78)

Bibliography

Manke, C., Miedl, S., Boissiere, O., Baumann, P. K., Lindner, J., Schumacher, M., Brodyanski, A., & Scheib, M. (2005). Atomic vapor deposition of Ru and RuO2 thin film layers for electrode applications. Microelectronic Engineering, 82(3â4), 242â247.

Authors 8

C. Manke (first)
S. Miedl (additional)
O. Boissiere (additional)
P.K. Baumann (additional)
J. Lindner (additional)
M. Schumacher (additional)
A. Brodyanski (additional)
M. Scheib (additional)

References 7 Referenced 12

10.1016/S0169-4332(97)80113-4 / Appl. Surf. Sci. by Hara (1997)
10.1016/j.mssp.2004.09.011 / Mater. Sci. Semicond. Proc. by Ťapajna (2004)
10.1002/1521-396X(199705)161:1<201::AID-PSSA201>3.0.CO;2-U / Phys. Status Solidi by Pan (1997)
10.1143/JJAP.37.3396 / J. Appl. Phys. by Joo (1998)
10.1149/1.2113647 / J. Electrochem. Soc. by Green (1985)
{'key': '10.1016/j.mee.2005.07.030_bib6', 'first-page': '23', 'author': 'Schumacher', 'year': '2002', 'journal-title': 'Eur. Semicond.'} / Eur. Semicond. by Schumacher (2002)
U. Weber, O. Boissière, J. Lindner, M. Schumacher, P. Lehnen, C. Manke, S. van Elshocht, M. Caymax, V. Cosnier, T. McEntee, These Proceedings.

Dates

Type	When
Created	20 years ago (Aug. 19, 2005, 7:32 a.m.)
Deposited	6 years, 7 months ago (Jan. 23, 2019, 8:29 a.m.)
Indexed	11 months, 1 week ago (Sept. 16, 2024, 10:43 a.m.)
Issued	19 years, 8 months ago (Dec. 1, 2005)
Published	19 years, 8 months ago (Dec. 1, 2005)
Published Print	19 years, 8 months ago (Dec. 1, 2005)

Funders 0

None

BibTeX

@article{Manke_2005, title={Atomic vapor deposition of Ru and RuO2 thin film layers for electrode applications}, volume={82}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/j.mee.2005.07.030}, DOI={10.1016/j.mee.2005.07.030}, number={3–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Manke, C. and Miedl, S. and Boissiere, O. and Baumann, P.K. and Lindner, J. and Schumacher, M. and Brodyanski, A. and Scheib, M.}, year={2005}, month=dec, pages={242–247} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        9,
        16
      ]
    ],
    "date-time": "2024-09-16T14:43:32Z",
    "timestamp": 1726497812925
  },
  "reference-count": 7,
  "publisher": "Elsevier BV",
  "issue": "3-4",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2005,
            12,
            1
          ]
        ],
        "date-time": "2005-12-01T00:00:00Z",
        "timestamp": 1133395200000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://www.elsevier.com/tdm/userlicense/1.0/"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        2005,
        12
      ]
    ]
  },
  "DOI": "10.1016/j.mee.2005.07.030",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2005,
        8,
        19
      ]
    ],
    "date-time": "2005-08-19T11:32:49Z",
    "timestamp": 1124451169000
  },
  "page": "242-247",
  "source": "Crossref",
  "is-referenced-by-count": 12,
  "title": "Atomic vapor deposition of Ru and RuO2 thin film layers for electrode applications",
  "prefix": "10.1016",
  "volume": "82",
  "author": [
    {
      "given": "C.",
      "family": "Manke",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "S.",
      "family": "Miedl",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "O.",
      "family": "Boissiere",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "P.K.",
      "family": "Baumann",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "J.",
      "family": "Lindner",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "M.",
      "family": "Schumacher",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "A.",
      "family": "Brodyanski",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "M.",
      "family": "Scheib",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "78",
  "reference": [
    {
      "key": "10.1016/j.mee.2005.07.030_bib1",
      "doi-asserted-by": "crossref",
      "first-page": "394",
      "DOI": "10.1016/S0169-4332(97)80113-4",
      "volume": "117/118",
      "author": "Hara",
      "year": "1997",
      "journal-title": "Appl. Surf. Sci."
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib2",
      "doi-asserted-by": "crossref",
      "first-page": "271",
      "DOI": "10.1016/j.mssp.2004.09.011",
      "volume": "7",
      "author": "\u0164apajna",
      "year": "2004",
      "journal-title": "Mater. Sci. Semicond. Proc."
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib3",
      "doi-asserted-by": "crossref",
      "first-page": "201",
      "DOI": "10.1002/1521-396X(199705)161:1<201::AID-PSSA201>3.0.CO;2-U",
      "volume": "161",
      "author": "Pan",
      "year": "1997",
      "journal-title": "Phys. Status Solidi"
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib4",
      "doi-asserted-by": "crossref",
      "first-page": "3396",
      "DOI": "10.1143/JJAP.37.3396",
      "volume": "37",
      "author": "Joo",
      "year": "1998",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib5",
      "doi-asserted-by": "crossref",
      "first-page": "2677",
      "DOI": "10.1149/1.2113647",
      "volume": "132",
      "author": "Green",
      "year": "1985",
      "journal-title": "J. Electrochem. Soc."
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib6",
      "first-page": "23",
      "author": "Schumacher",
      "year": "2002",
      "journal-title": "Eur. Semicond."
    },
    {
      "key": "10.1016/j.mee.2005.07.030_bib7",
      "unstructured": "U. Weber, O. Boissi\u00e8re, J. Lindner, M. Schumacher, P. Lehnen, C. Manke, S. van Elshocht, M. Caymax, V. Cosnier, T. McEntee, These Proceedings."
    }
  ],
  "container-title": "Microelectronic Engineering",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0167931705003473?httpAccept=text/xml",
      "content-type": "text/xml",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0167931705003473?httpAccept=text/plain",
      "content-type": "text/plain",
      "content-version": "vor",
      "intended-application": "text-mining"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2019,
        1,
        23
      ]
    ],
    "date-time": "2019-01-23T13:29:49Z",
    "timestamp": 1548250189000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://linkinghub.elsevier.com/retrieve/pii/S0167931705003473"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2005,
        12
      ]
    ]
  },
  "references-count": 7,
  "journal-issue": {
    "issue": "3-4",
    "published-print": {
      "date-parts": [
        [
          2005,
          12
        ]
      ]
    }
  },
  "alternative-id": [
    "S0167931705003473"
  ],
  "URL": "http://dx.doi.org/10.1016/j.mee.2005.07.030",
  "relation": {},
  "ISSN": [
    "0167-9317"
  ],
  "subject": [],
  "container-title-short": "Microelectronic Engineering",
  "published": {
    "date-parts": [
      [
        2005,
        12
      ]
    ]
  }
}