DOI: 10.1016/j.mattod.2014.04.026. A brief review of atomic layer deposition: from fundamentals to applications

A brief review of atomic layer deposition: from fundamentals to applications

10.1016/j.mattod.2014.04.026

Crossref journal-article

Elsevier BV

Materials Today (78)

Bibliography

Johnson, R. W., Hultqvist, A., & Bent, S. F. (2014). A brief review of atomic layer deposition: from fundamentals to applications. Materials Today, 17(5), 236â246.

Authors 3

Richard W. Johnson (first)
Adam Hultqvist (additional)
Stacey F. Bent (additional)

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Dates

Type	When
Created	11 years, 3 months ago (May 10, 2014, 9:45 a.m.)
Deposited	6 years ago (Aug. 10, 2019, 6:43 a.m.)
Indexed	16 minutes ago (Aug. 21, 2025, 8:43 a.m.)
Issued	11 years, 2 months ago (June 1, 2014)
Published	11 years, 2 months ago (June 1, 2014)
Published Print	11 years, 2 months ago (June 1, 2014)

Funders 1

U.S. Department of Energy 10.13039/100000015
Region: Americas
gov (National government)
Labels8
1. Energy Department
2. Department of Energy
3. United States Department of Energy
4. ENERGY.GOV
5. US Department of Energy
6. USDOE
7. DOE
8. USADOE

BibTeX

@article{Johnson_2014, title={A brief review of atomic layer deposition: from fundamentals to applications}, volume={17}, ISSN={1369-7021}, url={http://dx.doi.org/10.1016/j.mattod.2014.04.026}, DOI={10.1016/j.mattod.2014.04.026}, number={5}, journal={Materials Today}, publisher={Elsevier BV}, author={Johnson, Richard W. and Hultqvist, Adam and Bent, Stacey F.}, year={2014}, month=jun, pages={236–246} }

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