DOI: 10.1016/j.electacta.2008.03.017. The structural evolution and lithiation behavior of vacuum-deposited Si film with high reversible capacity

The structural evolution and lithiation behavior of vacuum-deposited Si film with high reversible capacity

10.1016/j.electacta.2008.03.017

Crossref journal-article

Elsevier BV

Electrochimica Acta (78)

Bibliography

Zhang, T., Zhang, H. P., Yang, L. C., Wang, B., Wu, Y. P., & Takamura, T. (2008). The structural evolution and lithiation behavior of vacuum-deposited Si film with high reversible capacity. Electrochimica Acta, 53(18), 5660â5664.

Authors 6

T. Zhang (first)
H.P. Zhang (additional)
L.C. Yang (additional)
B. Wang (additional)
Y.P. Wu (additional)
T. Takamura (additional)

References 32 Referenced 58

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Dates

Type	When
Created	17 years, 5 months ago (March 16, 2008, 7:41 a.m.)
Deposited	6 years, 8 months ago (Dec. 30, 2018, 7:57 p.m.)
Indexed	2 weeks, 2 days ago (Aug. 20, 2025, 8:22 a.m.)
Issued	17 years, 2 months ago (July 1, 2008)
Published	17 years, 2 months ago (July 1, 2008)
Published Print	17 years, 2 months ago (July 1, 2008)

Funders 0

None

BibTeX

@article{Zhang_2008, title={The structural evolution and lithiation behavior of vacuum-deposited Si film with high reversible capacity}, volume={53}, ISSN={0013-4686}, url={http://dx.doi.org/10.1016/j.electacta.2008.03.017}, DOI={10.1016/j.electacta.2008.03.017}, number={18}, journal={Electrochimica Acta}, publisher={Elsevier BV}, author={Zhang, T. and Zhang, H.P. and Yang, L.C. and Wang, B. and Wu, Y.P. and Takamura, T.}, year={2008}, month=jul, pages={5660–5664} }

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