DOI: 10.1016/j.compchemeng.2006.03.002. An object-oriented framework for modular chemical process simulation with semiconductor processing applications

An object-oriented framework for modular chemical process simulation with semiconductor processing applications

10.1016/j.compchemeng.2006.03.002

Crossref journal-article

Elsevier BV

Computers & Chemical Engineering (78)

Bibliography

Chen, J., & Adomaitis, R. A. (2006). An object-oriented framework for modular chemical process simulation with semiconductor processing applications. Computers & Chemical Engineering, 30(9), 1354â1380.

Authors 2

Jing Chen (first)
Raymond A. Adomaitis (additional)

References 78 Referenced 15

10.1016/S0098-1354(02)00040-6 / Computers and Chemical Engineering / Objects for MWR by Adomaitis (2002)
10.1016/S0895-7177(03)90013-6 / Mathematical and Computer Modeling / A reduced-basis discretization method for chemical vapor deposition reactor simulation by Adomaitis (2003)
10.1177/003754970007400104 / Simulation / A computational framework for boundary-value problem based simulations by Adomaitis (2000)
10.1109/ACC.1997.608956 / Proceedings of the American Control Conference / Nonlinear model reduction for simulation and control of rapid thermal processing by Aling (1997)
10.1016/0098-1354(94)E0038-O / Computers and Chemical Engineering / Modeling and control of microelectronics materials processing by Badgwell (1995)
10.1002/aic.690380613 / AIChE Journal / Modeling and scale-up of multiwafer LPCVD reactors by Badgwell (1992)
10.1016/S0040-6090(99)01049-4 / Thin Solid Films / Model-based control in rapid thermal processing by Balakrishnan (2000)
10.1109/66.670175 / IEEE Transactions on Semiconductor Manufacturing / Nonlinear model reduction strategies for rapid thermal processing systems by Banerjee (1998)
10.1137/S0036139901383280 / SIAM Journal on Applied Mathematics / Reduced order modeling and control of thin film growth in an HPCVD reactor by Banks (2002)
10.1016/S0967-0661(03)00154-0 / Control Engineering Practice / Run-to-run control and performance monitoring of overlay in semiconductor manufacturing by Bode (2004)
{'key': '10.1016/j.compchemeng.2006.03.002_bib11', 'first-page': '133', 'article-title': 'Case studies in equipment modeling and control in the microelectronics industry', 'volume': '316', 'author': 'Butler', 'year': '1997', 'journal-title': 'AIChE Symposium Series'} / AIChE Symposium Series / Case studies in equipment modeling and control in the microelectronics industry by Butler (1997)
10.1016/j.jprocont.2005.06.001 / Journal of Process Control / Perspectives on the design and control of multiscale systems by Braatz (2006)
10.1149/1.2086933 / Journal of the Electrochemical Society / Si deposition rates in a two-dimensional CVD reactor and comparisons with model calculations by Breiland (1990)
Cai, X. (1998). An object-oriented model for developing parallel PDE software: Vol. 4. Department of Informatics, University of Oslo [preprint].
{'key': '10.1016/j.compchemeng.2006.03.002_bib15', 'series-title': 'WCCM V, fifth world congress on computational mechanics', 'article-title': 'Developing parallel object-oriented simulation codes in Diffpack', 'author': 'Cai', 'year': '2002'} / WCCM V, fifth world congress on computational mechanics / Developing parallel object-oriented simulation codes in Diffpack by Cai (2002)
Chang, H.-Y., & Adomaitis, R. A. (1998). Model reduction for tungsten chemical vapor deposition. ISR Technical Report: TR 1998-28. College Park, MD, USA: University of Maryland.
10.1116/1.1333076 / Journal of Vacuum Science and Technology B / Influence of gas composition on wafer temperature in a tungsten chemical vapor deposition reactor: Experimental measurements, model development, and parameter estimation by Chang (2001)
10.1116/1.1695332 / Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures / In situ mass spectrometry in a 10 Torr W chemical vapor deposition process for film thickness metrology and real-time advanced process control by Cho (2004)
{'key': '10.1016/j.compchemeng.2006.03.002_bib19', 'series-title': 'JAVA design patterns', 'author': 'Cooper', 'year': '2000'} / JAVA design patterns by Cooper (2000)
10.1145/137926.137927 / ACM Transactions on Modeling and Computer Simulation / A modification of the process interaction world view by Cota (1992)
10.1016/S0098-1354(97)87601-6 / Computers and Chemical Engineering / The ModuSim concept for modular modeling and simulation in chemical engineering by Dieterich (1997)
{'key': '10.1016/j.compchemeng.2006.03.002_bib22', 'first-page': '4185', 'article-title': 'Model-based control in microelectronics manufacturing', 'volume': '4', 'author': 'Edgar', 'year': '1999', 'journal-title': 'Proceedings of the IEEE Conference on Decision and Control'} / Proceedings of the IEEE Conference on Decision and Control / Model-based control in microelectronics manufacturing by Edgar (1999)
10.1149/1.2407685 / Journal of the Electrochemical Society / A stagnant layer model for the epitaxial growth of silicon from silane in a horizontal reactor by Eversteijn (1970)
10.1016/0098-1354(90)87076-2 / Computers and Chemical Engineering / The sequential-clustered method for dynamic chemical plant simulation by Fagley (1990)
{'issue': '12', 'key': '10.1016/j.compchemeng.2006.03.002_bib25', 'first-page': '92', 'article-title': 'Symmetry breaking phenomena in vertical and horizontal CVD reactors', 'volume': '90', 'author': 'Fotiadis', 'year': '1990', 'journal-title': 'Proceedings—The Electrochemical Society'} / Proceedings—The Electrochemical Society / Symmetry breaking phenomena in vertical and horizontal CVD reactors by Fotiadis (1990)
{'key': '10.1016/j.compchemeng.2006.03.002_bib26', 'series-title': 'Design patterns: Elements of reusable object-oriented software', 'author': 'Gamma', 'year': '1995'} / Design patterns: Elements of reusable object-oriented software by Gamma (1995)
{'key': '10.1016/j.compchemeng.2006.03.002_bib27', 'series-title': 'The third workshop on software platforms for systems biology', 'article-title': 'Modular modeling of cellular systems', 'author': 'Ginkel', 'year': '2001'} / The third workshop on software platforms for systems biology / Modular modeling of cellular systems by Ginkel (2001)
10.1515/REVCE.1985.3.2.97 / Reviews in Chemical Engineering / Chemical vapor deposition: A chemical engineering perspective by Hess (1985)
10.1016/0098-1354(86)87008-9 / Computers and Chemical Engineering / Dynamic simulation of chemical engineering systems by the sequential modular approach by Hillestad (1986)
{'key': '10.1016/j.compchemeng.2006.03.002_bib30', 'series-title': 'Chemical vapor deposition—Principles and application', 'article-title': 'Chemical vapor deposition—An overview', 'author': 'Hitchman', 'year': '1993'} / Chemical vapor deposition—Principles and application / Chemical vapor deposition—An overview by Hitchman (1993)
10.1016/0098-1354(86)85043-8 / Computers and Chemical Engineering / The development of an equation-oriented flowsheet simulation and optimization package—I. The quasilin program by Hutchison (1986)
10.1016/0098-1354(86)85044-X / Computers and Chemical Engineering / The development of an equation-oriented flowsheet simulation and optimization package—II. Examples and results by Hutchison (1986)
10.1016/0022-0248(96)00277-1 / Journal of Crystal Growth / Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs by Ingle (1996)
10.1149/1.2115441 / Journal of the Electrochemical Society / Thermal diffusion effects in chemical vapor deposition reactors by Jenkinson (1984)
{'key': '10.1016/j.compchemeng.2006.03.002_bib35', 'first-page': '565', 'article-title': 'Fluid mechanics of chemical vapor deposition', 'volume': '2', 'author': 'Jensen', 'year': '1987', 'journal-title': 'ASME'} / ASME / Fluid mechanics of chemical vapor deposition by Jensen (1987)
{'issue': '4', 'key': '10.1016/j.compchemeng.2006.03.002_bib36', 'first-page': '142', 'article-title': 'Models of chemical kinetics and transport phenomena in chemical vapor deposition systems', 'volume': '91', 'author': 'Jensen', 'year': '1991', 'journal-title': 'Proceedings—The Electrochemical Society'} / Proceedings—The Electrochemical Society / Models of chemical kinetics and transport phenomena in chemical vapor deposition systems by Jensen (1991)
10.1149/1.2120129 / Journal of the Electrochemical Society / Modeling and analysis of low pressure CVD reactors by Jensen (1983)
10.1002/1099-1514(200007/08)21:4<143::AID-OCA671>3.0.CO;2-Y / Optimal Control Applications and Methods / Reduced order model compensator control of species transport in a CVD reactor by Kepler (2000)
10.1149/1.2085948 / Journal of the Electrochemical Society / A mathematical model of the hydrodynamics and gas-phase reactions in silicon LPCVD in a single-wafer reactor by Kleijn (1991)
{'key': '10.1016/j.compchemeng.2006.03.002_bib40', 'series-title': 'Computational modeling in semiconductor processing', 'article-title': 'Chemical vapor deposition processes', 'author': 'Kleijn', 'year': '1995'} / Computational modeling in semiconductor processing / Chemical vapor deposition processes by Kleijn (1995)
{'key': '10.1016/j.compchemeng.2006.03.002_bib41', 'series-title': 'Modeling of chemical vapor deposition of tungsten films', 'author': 'Kleijn', 'year': '1993'} / Modeling of chemical vapor deposition of tungsten films by Kleijn (1993)
10.1016/0040-6090(96)80077-0 / Thin Solid Films / A detailed model for low-pressure CVD of tungsten by Kuijlaars (1995)
{'key': '10.1016/j.compchemeng.2006.03.002_bib43', 'series-title': 'Computational partial differential equations—Numerical methods and diffpack programming', 'author': 'Langtangen', 'year': '1999'} / Computational partial differential equations—Numerical methods and diffpack programming by Langtangen (1999)
10.1145/382043.382045 / ACM Transactions on Mathematical Software / Solving systems of partial differential equations using object-oriented programming techniques with coupled heat and fluid flow as example by Langtangen (2001)
10.1016/j.compchemeng.2003.06.003 / Computers and Chemical Engineering / Processes synthesis and design of distillation sequences using modular simulators: A genetic algorithm framework by Leboreiro (2004)
{'key': '10.1016/j.compchemeng.2006.03.002_bib46', 'series-title': 'Fundamentals of microelectronics processing', 'author': 'Lee', 'year': '1990'} / Fundamentals of microelectronics processing by Lee (1990)
10.1016/0098-1354(94)80124-X / Computers and Chemical Engineering / The flexible modular approach in dynamic process simulation by Lee (1994)
10.1016/j.compchemeng.2003.12.010 / Computers and Chemical Engineering / Module-oriented automatic differentiation in chemical process systems optimization by Li (2004)
10.1016/S0098-1354(99)00272-0 / Computers and Chemical Engineering / MWRtools: A library for weighted residual method calculations by Lin (1999)
Lu, G., & Kaxiras, E. (2004). An overview of multiscale simulations of materials. http://arxiv.org/PS_cache/cond-mat/pdf/0401/0401073.pdf. arXiv:cond-mat/0401073, v1 [7 January]
10.1002/aic.690460502 / AIChE Journal / Multiscale modeling of hard materials: Challenges and opportunities for chemical engineering by Maroudas (2000)
10.1109/37.75572 / IEEE Control Systems Magazine / Real-time monitoring and control in plasma etching by McLaughlin (1991)
{'key': '10.1016/j.compchemeng.2006.03.002_bib53', 'series-title': 'Object oriented software construction', 'author': 'Meyer', 'year': '1988'} / Object oriented software construction by Meyer (1988)
10.1149/1.2115715 / Journal of the Electrochemical Society / Analysis of chemical vapor deposition of boron by Michaelidis (1984)
10.1149/1.2095638 / Journal of the Electrochemical Society / Three-dimensional flow effects in silicon CVD in horizontal by Moffat (1988)
{'key': '10.1016/j.compchemeng.2006.03.002_bib56', 'first-page': '16', 'article-title': 'Model-based process control for 300\u2009mm manufacturing: Part I—lot-level control', 'author': 'Patel', 'year': '2004', 'journal-title': 'Future Fab International'} / Future Fab International / Model-based process control for 300 mm manufacturing: Part I—lot-level control by Patel (2004)
{'key': '10.1016/j.compchemeng.2006.03.002_bib57', 'series-title': 'Proceedings of the second international conference on foundations of computer-aided process design', 'first-page': '309', 'article-title': 'Equation-oriented flowsheeting', 'author': 'Perkins', 'year': '1983'} / Proceedings of the second international conference on foundations of computer-aided process design / Equation-oriented flowsheeting by Perkins (1983)
10.1016/0098-1354(95)00218-9 / Computers and Chemical Engineering / An object-oriented approach to general purpose fluid dynamics software by Peskin (1996)
10.1109/WSC.1998.745012 / Winter Simulation Conference Proceedings / Hierarchical modular modeling in discrete simulation by Pidd (1998)
{'key': '10.1016/j.compchemeng.2006.03.002_bib60', 'series-title': 'Silicon VLSI technology: Fundamentals, practice and modeling', 'author': 'Plummer', 'year': '2000'} / Silicon VLSI technology: Fundamentals, practice and modeling by Plummer (2000)
10.1016/0098-1354(83)85002-9 / Computers and Chemical Engineering / Dynamic process simulation using flowsheet structure by Ponton (1983)
{'key': '10.1016/j.compchemeng.2006.03.002_bib62', 'series-title': 'Software engineering: A practitioner’s approach', 'author': 'PressMan', 'year': '1997'} / Software engineering: A practitioner’s approach by PressMan (1997)
{'key': '10.1016/j.compchemeng.2006.03.002_bib63', 'series-title': 'Semiconductor manufacturing technology', 'author': 'Quirk', 'year': '2001'} / Semiconductor manufacturing technology by Quirk (2001)
10.1016/S1385-8947(02)00065-7 / Chemical Engineering Journal / Recent developments on multiscale, hierarchical modeling of chemical reactors by Raimondeau (2002)
Ramirez, F. P., Acosta, R. P., & Rivera, W. (2001). An object-oriented framework for parallel incompressible flow simulations. http://mayaweb.upr.clu.edu/crc/crc2001/[papers/freddy-perez/pdf].
Ramirez, F. P., & Rivera, W. (2003). An object-oriented framework for computational fluid dynamics simulations. http://mayaweb.upr.clu.edu/crc/crc2003/[papers/FreddyPerez.pdf].
10.1149/1.2100756 / Journal of the Electrochemical Society / Low pressure CVD of silicon nitride by Roenigk (1987)
10.1016/0098-1354(82)87001-4 / Computers and Chemical Engineering / Equation oriented approach to process flowsheeting by Shacham (1982)
{'key': '10.1016/j.compchemeng.2006.03.002_bib69', 'series-title': 'Design patterns explained', 'author': 'Shalloway', 'year': '2002'} / Design patterns explained by Shalloway (2002)
{'key': '10.1016/j.compchemeng.2006.03.002_bib70', 'series-title': 'Proceedings of the summer computer simulation conference', 'first-page': '325', 'article-title': 'Recent progress in equation-based process flowsheeting', 'author': 'Stadtherr', 'year': '1985'} / Proceedings of the summer computer simulation conference / Recent progress in equation-based process flowsheeting by Stadtherr (1985)
{'key': '10.1016/j.compchemeng.2006.03.002_bib71', 'first-page': '79', 'article-title': 'Model-based control of rapid thermal processes', 'volume': '1', 'author': 'Stuber', 'year': '1994', 'journal-title': 'Proceedings of the IEEE Conference on Decision and Control'} / Proceedings of the IEEE Conference on Decision and Control / Model-based control of rapid thermal processes by Stuber (1994)
10.1149/1.2404006 / Journal of the Electrochemical Society / Gas flow pattern and mass transfer analysis in a horizontal flow reactor for chemical vapor deposition by Takahashi (1972)
10.1109/66.661288 / IEEE Transactions on Semiconductor Manufacturing / Model reduction for optimization of rapid thermal chemical vapor deposition systems by Theodoropoulou (1998)
10.1149/1.2221647 / Journal of the Electrochemical Society / Modeling of gas-phase chemistry in the chemical vapor deposition of polysilicon in a cold wall system by Toprac (1993)
10.1016/0040-6090(77)90099-2 / Thin Solid Films / Hydrodynamic description of CVD processes by Wahl (1977)
Xu, Y. H. (2001). Real-time in-situ chemical sensing, sensor-based film thickness metrology, and process control in W CVD process. Ph.D. thesis. College Park, MD, USA: University of Maryland.
{'key': '10.1016/j.compchemeng.2006.03.002_bib77', 'series-title': 'Multifaceted modeling and discrete event simulation', 'author': 'Zeigler', 'year': '1984'} / Multifaceted modeling and discrete event simulation by Zeigler (1984)
{'key': '10.1016/j.compchemeng.2006.03.002_bib78', 'series-title': 'Object-oriented simulation with hierarchical modular models: Intelligent agents and endomorphic systems', 'author': 'Zeigler', 'year': '1990'} / Object-oriented simulation with hierarchical modular models: Intelligent agents and endomorphic systems by Zeigler (1990)

Dates

Type	When
Created	19 years, 2 months ago (June 11, 2006, 9:31 a.m.)
Deposited	6 years, 7 months ago (Jan. 15, 2019, 6:22 p.m.)
Indexed	1 year, 11 months ago (Sept. 11, 2023, 12:25 p.m.)
Issued	19 years, 1 month ago (July 1, 2006)
Published	19 years, 1 month ago (July 1, 2006)
Published Print	19 years, 1 month ago (July 1, 2006)

Funders 0

None

BibTeX

@article{Chen_2006, title={An object-oriented framework for modular chemical process simulation with semiconductor processing applications}, volume={30}, ISSN={0098-1354}, url={http://dx.doi.org/10.1016/j.compchemeng.2006.03.002}, DOI={10.1016/j.compchemeng.2006.03.002}, number={9}, journal={Computers & Chemical Engineering}, publisher={Elsevier BV}, author={Chen, Jing and Adomaitis, Raymond A.}, year={2006}, month=jul, pages={1354–1380} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2023,
        9,
        11
      ]
    ],
    "date-time": "2023-09-11T16:25:51Z",
    "timestamp": 1694449551625
  },
  "reference-count": 78,
  "publisher": "Elsevier BV",
  "issue": "9",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2006,
            7,
            1
          ]
        ],
        "date-time": "2006-07-01T00:00:00Z",
        "timestamp": 1151712000000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://www.elsevier.com/tdm/userlicense/1.0/"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        2006,
        7
      ]
    ]
  },
  "DOI": "10.1016/j.compchemeng.2006.03.002",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2006,
        6,
        11
      ]
    ],
    "date-time": "2006-06-11T13:31:49Z",
    "timestamp": 1150032709000
  },
  "page": "1354-1380",
  "source": "Crossref",
  "is-referenced-by-count": 15,
  "title": "An object-oriented framework for modular chemical process simulation with semiconductor processing applications",
  "prefix": "10.1016",
  "volume": "30",
  "author": [
    {
      "given": "Jing",
      "family": "Chen",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Raymond A.",
      "family": "Adomaitis",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "78",
  "reference": [
    {
      "issue": "7\u20138",
      "key": "10.1016/j.compchemeng.2006.03.002_bib1",
      "doi-asserted-by": "crossref",
      "first-page": "981",
      "DOI": "10.1016/S0098-1354(02)00040-6",
      "article-title": "Objects for MWR",
      "volume": "26",
      "author": "Adomaitis",
      "year": "2002",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib2",
      "doi-asserted-by": "crossref",
      "first-page": "159",
      "DOI": "10.1016/S0895-7177(03)90013-6",
      "article-title": "A reduced-basis discretization method for chemical vapor deposition reactor simulation",
      "volume": "38",
      "author": "Adomaitis",
      "year": "2003",
      "journal-title": "Mathematical and Computer Modeling"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib3",
      "doi-asserted-by": "crossref",
      "first-page": "28",
      "DOI": "10.1177/003754970007400104",
      "article-title": "A computational framework for boundary-value problem based simulations",
      "volume": "74",
      "author": "Adomaitis",
      "year": "2000",
      "journal-title": "Simulation"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib4",
      "doi-asserted-by": "crossref",
      "first-page": "2233",
      "DOI": "10.1109/ACC.1997.608956",
      "article-title": "Nonlinear model reduction for simulation and control of rapid thermal processing",
      "volume": "4",
      "author": "Aling",
      "year": "1997",
      "journal-title": "Proceedings of the American Control Conference"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib5",
      "doi-asserted-by": "crossref",
      "first-page": "1",
      "DOI": "10.1016/0098-1354(94)E0038-O",
      "article-title": "Modeling and control of microelectronics materials processing",
      "volume": "19",
      "author": "Badgwell",
      "year": "1995",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "6",
      "key": "10.1016/j.compchemeng.2006.03.002_bib6",
      "doi-asserted-by": "crossref",
      "first-page": "926",
      "DOI": "10.1002/aic.690380613",
      "article-title": "Modeling and scale-up of multiwafer LPCVD reactors",
      "volume": "38",
      "author": "Badgwell",
      "year": "1992",
      "journal-title": "AIChE Journal"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib7",
      "doi-asserted-by": "crossref",
      "first-page": "322",
      "DOI": "10.1016/S0040-6090(99)01049-4",
      "article-title": "Model-based control in rapid thermal processing",
      "volume": "365",
      "author": "Balakrishnan",
      "year": "2000",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib8",
      "doi-asserted-by": "crossref",
      "first-page": "266",
      "DOI": "10.1109/66.670175",
      "article-title": "Nonlinear model reduction strategies for rapid thermal processing systems",
      "volume": "11",
      "author": "Banerjee",
      "year": "1998",
      "journal-title": "IEEE Transactions on Semiconductor Manufacturing"
    },
    {
      "issue": "4",
      "key": "10.1016/j.compchemeng.2006.03.002_bib9",
      "doi-asserted-by": "crossref",
      "first-page": "1251",
      "DOI": "10.1137/S0036139901383280",
      "article-title": "Reduced order modeling and control of thin film growth in an HPCVD reactor",
      "volume": "62",
      "author": "Banks",
      "year": "2002",
      "journal-title": "SIAM Journal on Applied Mathematics"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib10",
      "doi-asserted-by": "crossref",
      "first-page": "893",
      "DOI": "10.1016/S0967-0661(03)00154-0",
      "article-title": "Run-to-run control and performance monitoring of overlay in semiconductor manufacturing",
      "volume": "12",
      "author": "Bode",
      "year": "2004",
      "journal-title": "Control Engineering Practice"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib11",
      "first-page": "133",
      "article-title": "Case studies in equipment modeling and control in the microelectronics industry",
      "volume": "316",
      "author": "Butler",
      "year": "1997",
      "journal-title": "AIChE Symposium Series"
    },
    {
      "issue": "3",
      "key": "10.1016/j.compchemeng.2006.03.002_bib12",
      "doi-asserted-by": "crossref",
      "first-page": "193",
      "DOI": "10.1016/j.jprocont.2005.06.001",
      "article-title": "Perspectives on the design and control of multiscale systems",
      "volume": "16",
      "author": "Braatz",
      "year": "2006",
      "journal-title": "Journal of Process Control"
    },
    {
      "issue": "7",
      "key": "10.1016/j.compchemeng.2006.03.002_bib13",
      "doi-asserted-by": "crossref",
      "first-page": "2313",
      "DOI": "10.1149/1.2086933",
      "article-title": "Si deposition rates in a two-dimensional CVD reactor and comparisons with model calculations",
      "volume": "137",
      "author": "Breiland",
      "year": "1990",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib14",
      "unstructured": "Cai, X. (1998). An object-oriented model for developing parallel PDE software: Vol. 4. Department of Informatics, University of Oslo [preprint]."
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib15",
      "series-title": "WCCM V, fifth world congress on computational mechanics",
      "article-title": "Developing parallel object-oriented simulation codes in Diffpack",
      "author": "Cai",
      "year": "2002"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib16",
      "unstructured": "Chang, H.-Y., & Adomaitis, R. A. (1998). Model reduction for tungsten chemical vapor deposition. ISR Technical Report: TR 1998-28. College Park, MD, USA: University of Maryland."
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib17",
      "doi-asserted-by": "crossref",
      "first-page": "230",
      "DOI": "10.1116/1.1333076",
      "article-title": "Influence of gas composition on wafer temperature in a tungsten chemical vapor deposition reactor: Experimental measurements, model development, and parameter estimation",
      "volume": "19",
      "author": "Chang",
      "year": "2001",
      "journal-title": "Journal of Vacuum Science and Technology B"
    },
    {
      "issue": "3",
      "key": "10.1016/j.compchemeng.2006.03.002_bib18",
      "doi-asserted-by": "crossref",
      "first-page": "880",
      "DOI": "10.1116/1.1695332",
      "article-title": "In situ mass spectrometry in a 10\u2009Torr\u2009W chemical vapor deposition process for film thickness metrology and real-time advanced process control",
      "volume": "22",
      "author": "Cho",
      "year": "2004",
      "journal-title": "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib19",
      "series-title": "JAVA design patterns",
      "author": "Cooper",
      "year": "2000"
    },
    {
      "issue": "2",
      "key": "10.1016/j.compchemeng.2006.03.002_bib20",
      "doi-asserted-by": "crossref",
      "first-page": "109",
      "DOI": "10.1145/137926.137927",
      "article-title": "A modification of the process interaction world view",
      "volume": "2",
      "author": "Cota",
      "year": "1992",
      "journal-title": "ACM Transactions on Modeling and Computer Simulation"
    },
    {
      "issue": "Suppl.",
      "key": "10.1016/j.compchemeng.2006.03.002_bib21",
      "doi-asserted-by": "crossref",
      "first-page": "s805",
      "DOI": "10.1016/S0098-1354(97)87601-6",
      "article-title": "The ModuSim concept for modular modeling and simulation in chemical engineering",
      "volume": "21",
      "author": "Dieterich",
      "year": "1997",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib22",
      "first-page": "4185",
      "article-title": "Model-based control in microelectronics manufacturing",
      "volume": "4",
      "author": "Edgar",
      "year": "1999",
      "journal-title": "Proceedings of the IEEE Conference on Decision and Control"
    },
    {
      "issue": "7",
      "key": "10.1016/j.compchemeng.2006.03.002_bib23",
      "doi-asserted-by": "crossref",
      "first-page": "925",
      "DOI": "10.1149/1.2407685",
      "article-title": "A stagnant layer model for the epitaxial growth of silicon from silane in a horizontal reactor",
      "volume": "117",
      "author": "Eversteijn",
      "year": "1970",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib24",
      "doi-asserted-by": "crossref",
      "first-page": "161",
      "DOI": "10.1016/0098-1354(90)87076-2",
      "article-title": "The sequential-clustered method for dynamic chemical plant simulation",
      "volume": "14",
      "author": "Fagley",
      "year": "1990",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "12",
      "key": "10.1016/j.compchemeng.2006.03.002_bib25",
      "first-page": "92",
      "article-title": "Symmetry breaking phenomena in vertical and horizontal CVD reactors",
      "volume": "90",
      "author": "Fotiadis",
      "year": "1990",
      "journal-title": "Proceedings\u2014The Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib26",
      "series-title": "Design patterns: Elements of reusable object-oriented software",
      "author": "Gamma",
      "year": "1995"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib27",
      "series-title": "The third workshop on software platforms for systems biology",
      "article-title": "Modular modeling of cellular systems",
      "author": "Ginkel",
      "year": "2001"
    },
    {
      "issue": "2",
      "key": "10.1016/j.compchemeng.2006.03.002_bib28",
      "doi-asserted-by": "crossref",
      "first-page": "97",
      "DOI": "10.1515/REVCE.1985.3.2.97",
      "article-title": "Chemical vapor deposition: A chemical engineering perspective",
      "volume": "3",
      "author": "Hess",
      "year": "1985",
      "journal-title": "Reviews in Chemical Engineering"
    },
    {
      "issue": "4",
      "key": "10.1016/j.compchemeng.2006.03.002_bib29",
      "doi-asserted-by": "crossref",
      "first-page": "377",
      "DOI": "10.1016/0098-1354(86)87008-9",
      "article-title": "Dynamic simulation of chemical engineering systems by the sequential modular approach",
      "volume": "10",
      "author": "Hillestad",
      "year": "1986",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib30",
      "series-title": "Chemical vapor deposition\u2014Principles and application",
      "article-title": "Chemical vapor deposition\u2014An overview",
      "author": "Hitchman",
      "year": "1993"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib31",
      "doi-asserted-by": "crossref",
      "first-page": "19",
      "DOI": "10.1016/0098-1354(86)85043-8",
      "article-title": "The development of an equation-oriented flowsheet simulation and optimization package\u2014I. The quasilin program",
      "volume": "10",
      "author": "Hutchison",
      "year": "1986",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib32",
      "doi-asserted-by": "crossref",
      "first-page": "31",
      "DOI": "10.1016/0098-1354(86)85044-X",
      "article-title": "The development of an equation-oriented flowsheet simulation and optimization package\u2014II. Examples and results",
      "volume": "10",
      "author": "Hutchison",
      "year": "1986",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "3\u20134",
      "key": "10.1016/j.compchemeng.2006.03.002_bib33",
      "doi-asserted-by": "crossref",
      "first-page": "543",
      "DOI": "10.1016/0022-0248(96)00277-1",
      "article-title": "Reaction kinetics and transport phenomena underlying the low-pressure metalorganic chemical vapor deposition of GaAs",
      "volume": "167",
      "author": "Ingle",
      "year": "1996",
      "journal-title": "Journal of Crystal Growth"
    },
    {
      "issue": "12",
      "key": "10.1016/j.compchemeng.2006.03.002_bib34",
      "doi-asserted-by": "crossref",
      "first-page": "2911",
      "DOI": "10.1149/1.2115441",
      "article-title": "Thermal diffusion effects in chemical vapor deposition reactors",
      "volume": "131",
      "author": "Jenkinson",
      "year": "1984",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib35",
      "first-page": "565",
      "article-title": "Fluid mechanics of chemical vapor deposition",
      "volume": "2",
      "author": "Jensen",
      "year": "1987",
      "journal-title": "ASME"
    },
    {
      "issue": "4",
      "key": "10.1016/j.compchemeng.2006.03.002_bib36",
      "first-page": "142",
      "article-title": "Models of chemical kinetics and transport phenomena in chemical vapor deposition systems",
      "volume": "91",
      "author": "Jensen",
      "year": "1991",
      "journal-title": "Proceedings\u2014The Electrochemical Society"
    },
    {
      "issue": "9",
      "key": "10.1016/j.compchemeng.2006.03.002_bib37",
      "doi-asserted-by": "crossref",
      "first-page": "1950",
      "DOI": "10.1149/1.2120129",
      "article-title": "Modeling and analysis of low pressure CVD reactors",
      "volume": "130",
      "author": "Jensen",
      "year": "1983",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "issue": "4",
      "key": "10.1016/j.compchemeng.2006.03.002_bib38",
      "doi-asserted-by": "crossref",
      "first-page": "143",
      "DOI": "10.1002/1099-1514(200007/08)21:4<143::AID-OCA671>3.0.CO;2-Y",
      "article-title": "Reduced order model compensator control of species transport in a CVD reactor",
      "volume": "21",
      "author": "Kepler",
      "year": "2000",
      "journal-title": "Optimal Control Applications and Methods"
    },
    {
      "issue": "7",
      "key": "10.1016/j.compchemeng.2006.03.002_bib39",
      "doi-asserted-by": "crossref",
      "first-page": "2190",
      "DOI": "10.1149/1.2085948",
      "article-title": "A mathematical model of the hydrodynamics and gas-phase reactions in silicon LPCVD in a single-wafer reactor",
      "volume": "138",
      "author": "Kleijn",
      "year": "1991",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib40",
      "series-title": "Computational modeling in semiconductor processing",
      "article-title": "Chemical vapor deposition processes",
      "author": "Kleijn",
      "year": "1995"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib41",
      "series-title": "Modeling of chemical vapor deposition of tungsten films",
      "author": "Kleijn",
      "year": "1993"
    },
    {
      "issue": "1\u20132",
      "key": "10.1016/j.compchemeng.2006.03.002_bib42",
      "doi-asserted-by": "crossref",
      "first-page": "456",
      "DOI": "10.1016/0040-6090(96)80077-0",
      "article-title": "A detailed model for low-pressure CVD of tungsten",
      "volume": "270",
      "author": "Kuijlaars",
      "year": "1995",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib43",
      "series-title": "Computational partial differential equations\u2014Numerical methods and diffpack programming",
      "author": "Langtangen",
      "year": "1999"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib44",
      "doi-asserted-by": "crossref",
      "first-page": "1",
      "DOI": "10.1145/382043.382045",
      "article-title": "Solving systems of partial differential equations using object-oriented programming techniques with coupled heat and fluid flow as example",
      "volume": "27",
      "author": "Langtangen",
      "year": "2001",
      "journal-title": "ACM Transactions on Mathematical Software"
    },
    {
      "issue": "8",
      "key": "10.1016/j.compchemeng.2006.03.002_bib45",
      "doi-asserted-by": "crossref",
      "first-page": "1223",
      "DOI": "10.1016/j.compchemeng.2003.06.003",
      "article-title": "Processes synthesis and design of distillation sequences using modular simulators: A genetic algorithm framework",
      "volume": "28",
      "author": "Leboreiro",
      "year": "2004",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib46",
      "series-title": "Fundamentals of microelectronics processing",
      "author": "Lee",
      "year": "1990"
    },
    {
      "issue": "Suppl.",
      "key": "10.1016/j.compchemeng.2006.03.002_bib47",
      "doi-asserted-by": "crossref",
      "first-page": "s761",
      "DOI": "10.1016/0098-1354(94)80124-X",
      "article-title": "The flexible modular approach in dynamic process simulation",
      "volume": "18",
      "author": "Lee",
      "year": "1994",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "9",
      "key": "10.1016/j.compchemeng.2006.03.002_bib48",
      "doi-asserted-by": "crossref",
      "first-page": "1551",
      "DOI": "10.1016/j.compchemeng.2003.12.010",
      "article-title": "Module-oriented automatic differentiation in chemical process systems optimization",
      "volume": "28",
      "author": "Li",
      "year": "2004",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "issue": "8",
      "key": "10.1016/j.compchemeng.2006.03.002_bib49",
      "doi-asserted-by": "crossref",
      "first-page": "1041",
      "DOI": "10.1016/S0098-1354(99)00272-0",
      "article-title": "MWRtools: A library for weighted residual method calculations",
      "volume": "23",
      "author": "Lin",
      "year": "1999",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib50",
      "unstructured": "Lu, G., & Kaxiras, E. (2004). An overview of multiscale simulations of materials. http://arxiv.org/PS_cache/cond-mat/pdf/0401/0401073.pdf. arXiv:cond-mat/0401073, v1 [7 January]"
    },
    {
      "issue": "5",
      "key": "10.1016/j.compchemeng.2006.03.002_bib51",
      "doi-asserted-by": "crossref",
      "first-page": "878",
      "DOI": "10.1002/aic.690460502",
      "article-title": "Multiscale modeling of hard materials: Challenges and opportunities for chemical engineering",
      "volume": "46",
      "author": "Maroudas",
      "year": "2000",
      "journal-title": "AIChE Journal"
    },
    {
      "issue": "3",
      "key": "10.1016/j.compchemeng.2006.03.002_bib52",
      "doi-asserted-by": "crossref",
      "first-page": "3",
      "DOI": "10.1109/37.75572",
      "article-title": "Real-time monitoring and control in plasma etching",
      "volume": "11",
      "author": "McLaughlin",
      "year": "1991",
      "journal-title": "IEEE Control Systems Magazine"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib53",
      "series-title": "Object oriented software construction",
      "author": "Meyer",
      "year": "1988"
    },
    {
      "issue": "4",
      "key": "10.1016/j.compchemeng.2006.03.002_bib54",
      "doi-asserted-by": "crossref",
      "first-page": "860",
      "DOI": "10.1149/1.2115715",
      "article-title": "Analysis of chemical vapor deposition of boron",
      "volume": "131",
      "author": "Michaelidis",
      "year": "1984",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "issue": "2",
      "key": "10.1016/j.compchemeng.2006.03.002_bib55",
      "doi-asserted-by": "crossref",
      "first-page": "459",
      "DOI": "10.1149/1.2095638",
      "article-title": "Three-dimensional flow effects in silicon CVD in horizontal",
      "volume": "135",
      "author": "Moffat",
      "year": "1988",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib56",
      "first-page": "16",
      "article-title": "Model-based process control for 300\u2009mm manufacturing: Part I\u2014lot-level control",
      "author": "Patel",
      "year": "2004",
      "journal-title": "Future Fab International"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib57",
      "series-title": "Proceedings of the second international conference on foundations of computer-aided process design",
      "first-page": "309",
      "article-title": "Equation-oriented flowsheeting",
      "author": "Perkins",
      "year": "1983"
    },
    {
      "issue": "8",
      "key": "10.1016/j.compchemeng.2006.03.002_bib58",
      "doi-asserted-by": "crossref",
      "first-page": "1043",
      "DOI": "10.1016/0098-1354(95)00218-9",
      "article-title": "An object-oriented approach to general purpose fluid dynamics software",
      "volume": "20",
      "author": "Peskin",
      "year": "1996",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib59",
      "doi-asserted-by": "crossref",
      "first-page": "383",
      "DOI": "10.1109/WSC.1998.745012",
      "article-title": "Hierarchical modular modeling in discrete simulation",
      "volume": "1",
      "author": "Pidd",
      "year": "1998",
      "journal-title": "Winter Simulation Conference Proceedings"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib60",
      "series-title": "Silicon VLSI technology: Fundamentals, practice and modeling",
      "author": "Plummer",
      "year": "2000"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib61",
      "doi-asserted-by": "crossref",
      "first-page": "13",
      "DOI": "10.1016/0098-1354(83)85002-9",
      "article-title": "Dynamic process simulation using flowsheet structure",
      "volume": "7",
      "author": "Ponton",
      "year": "1983",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib62",
      "series-title": "Software engineering: A practitioner\u2019s approach",
      "author": "PressMan",
      "year": "1997"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib63",
      "series-title": "Semiconductor manufacturing technology",
      "author": "Quirk",
      "year": "2001"
    },
    {
      "issue": "1\u20132",
      "key": "10.1016/j.compchemeng.2006.03.002_bib64",
      "doi-asserted-by": "crossref",
      "first-page": "3",
      "DOI": "10.1016/S1385-8947(02)00065-7",
      "article-title": "Recent developments on multiscale, hierarchical modeling of chemical reactors",
      "volume": "90",
      "author": "Raimondeau",
      "year": "2002",
      "journal-title": "Chemical Engineering Journal"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib65",
      "unstructured": "Ramirez, F. P., Acosta, R. P., & Rivera, W. (2001). An object-oriented framework for parallel incompressible flow simulations. http://mayaweb.upr.clu.edu/crc/crc2001/[papers/freddy-perez/pdf]."
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib66",
      "unstructured": "Ramirez, F. P., & Rivera, W. (2003). An object-oriented framework for computational fluid dynamics simulations. http://mayaweb.upr.clu.edu/crc/crc2003/[papers/FreddyPerez.pdf]."
    },
    {
      "issue": "7",
      "key": "10.1016/j.compchemeng.2006.03.002_bib67",
      "doi-asserted-by": "crossref",
      "first-page": "1777",
      "DOI": "10.1149/1.2100756",
      "article-title": "Low pressure CVD of silicon nitride",
      "volume": "134",
      "author": "Roenigk",
      "year": "1987",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "issue": "2",
      "key": "10.1016/j.compchemeng.2006.03.002_bib68",
      "doi-asserted-by": "crossref",
      "first-page": "79",
      "DOI": "10.1016/0098-1354(82)87001-4",
      "article-title": "Equation oriented approach to process flowsheeting",
      "volume": "6",
      "author": "Shacham",
      "year": "1982",
      "journal-title": "Computers and Chemical Engineering"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib69",
      "series-title": "Design patterns explained",
      "author": "Shalloway",
      "year": "2002"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib70",
      "series-title": "Proceedings of the summer computer simulation conference",
      "first-page": "325",
      "article-title": "Recent progress in equation-based process flowsheeting",
      "author": "Stadtherr",
      "year": "1985"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib71",
      "first-page": "79",
      "article-title": "Model-based control of rapid thermal processes",
      "volume": "1",
      "author": "Stuber",
      "year": "1994",
      "journal-title": "Proceedings of the IEEE Conference on Decision and Control"
    },
    {
      "issue": "10",
      "key": "10.1016/j.compchemeng.2006.03.002_bib72",
      "doi-asserted-by": "crossref",
      "first-page": "1406",
      "DOI": "10.1149/1.2404006",
      "article-title": "Gas flow pattern and mass transfer analysis in a horizontal flow reactor for chemical vapor deposition",
      "volume": "119",
      "author": "Takahashi",
      "year": "1972",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "issue": "1",
      "key": "10.1016/j.compchemeng.2006.03.002_bib73",
      "doi-asserted-by": "crossref",
      "first-page": "85",
      "DOI": "10.1109/66.661288",
      "article-title": "Model reduction for optimization of rapid thermal chemical vapor deposition systems",
      "volume": "11",
      "author": "Theodoropoulou",
      "year": "1998",
      "journal-title": "IEEE Transactions on Semiconductor Manufacturing"
    },
    {
      "issue": "6",
      "key": "10.1016/j.compchemeng.2006.03.002_bib74",
      "doi-asserted-by": "crossref",
      "first-page": "1809",
      "DOI": "10.1149/1.2221647",
      "article-title": "Modeling of gas-phase chemistry in the chemical vapor deposition of polysilicon in a cold wall system",
      "volume": "140",
      "author": "Toprac",
      "year": "1993",
      "journal-title": "Journal of the Electrochemical Society"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib75",
      "doi-asserted-by": "crossref",
      "first-page": "13",
      "DOI": "10.1016/0040-6090(77)90099-2",
      "article-title": "Hydrodynamic description of CVD processes",
      "volume": "40",
      "author": "Wahl",
      "year": "1977",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib76",
      "unstructured": "Xu, Y. H. (2001). Real-time in-situ chemical sensing, sensor-based film thickness metrology, and process control in W CVD process. Ph.D. thesis. College Park, MD, USA: University of Maryland."
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib77",
      "series-title": "Multifaceted modeling and discrete event simulation",
      "author": "Zeigler",
      "year": "1984"
    },
    {
      "key": "10.1016/j.compchemeng.2006.03.002_bib78",
      "series-title": "Object-oriented simulation with hierarchical modular models: Intelligent agents and endomorphic systems",
      "author": "Zeigler",
      "year": "1990"
    }
  ],
  "container-title": "Computers &amp; Chemical Engineering",
  "original-title": [],
  "language": "en",
  "link": [
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0098135406000512?httpAccept=text/xml",
      "content-type": "text/xml",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://api.elsevier.com/content/article/PII:S0098135406000512?httpAccept=text/plain",
      "content-type": "text/plain",
      "content-version": "vor",
      "intended-application": "text-mining"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2019,
        1,
        15
      ]
    ],
    "date-time": "2019-01-15T23:22:17Z",
    "timestamp": 1547594537000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://linkinghub.elsevier.com/retrieve/pii/S0098135406000512"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        2006,
        7
      ]
    ]
  },
  "references-count": 78,
  "journal-issue": {
    "issue": "9",
    "published-print": {
      "date-parts": [
        [
          2006,
          7
        ]
      ]
    }
  },
  "alternative-id": [
    "S0098135406000512"
  ],
  "URL": "http://dx.doi.org/10.1016/j.compchemeng.2006.03.002",
  "relation": {},
  "ISSN": [
    "0098-1354"
  ],
  "subject": [],
  "container-title-short": "Computers &amp; Chemical Engineering",
  "published": {
    "date-parts": [
      [
        2006,
        7
      ]
    ]
  }
}