DOI: 10.1016/j.cocis.2011.04.005. Hydration force due to the reduced screening of the electrostatic repulsion in few-nanometer-thick films

Hydration force due to the reduced screening of the electrostatic repulsion in few-nanometer-thick films

10.1016/j.cocis.2011.04.005

Crossref journal-article

Elsevier BV

Current Opinion in Colloid & Interface Science (78)

Bibliography

Kralchevsky, P. A., Danov, K. D., & Basheva, E. S. (2011). Hydration force due to the reduced screening of the electrostatic repulsion in few-nanometer-thick films. Current Opinion in Colloid & Interface Science, 16(6), 517â524.

Authors 3

Peter A. Kralchevsky (first)
Krassimir D. Danov (additional)
Elka S. Basheva (additional)

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Dates

Type	When
Created	14 years, 3 months ago (May 7, 2011, 8:56 p.m.)
Deposited	3 years, 8 months ago (Nov. 22, 2021, 5:14 p.m.)
Indexed	1 year, 2 months ago (May 31, 2024, 2:31 a.m.)
Issued	13 years, 8 months ago (Dec. 1, 2011)
Published	13 years, 8 months ago (Dec. 1, 2011)
Published Print	13 years, 8 months ago (Dec. 1, 2011)

Funders 0

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BibTeX

@article{Kralchevsky_2011, title={Hydration force due to the reduced screening of the electrostatic repulsion in few-nanometer-thick films}, volume={16}, ISSN={1359-0294}, url={http://dx.doi.org/10.1016/j.cocis.2011.04.005}, DOI={10.1016/j.cocis.2011.04.005}, number={6}, journal={Current Opinion in Colloid & Interface Science}, publisher={Elsevier BV}, author={Kralchevsky, Peter A. and Danov, Krassimir D. and Basheva, Elka S.}, year={2011}, month=dec, pages={517–524} }

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