DOI: 10.1016/s0927-796x(97)00023-5. Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

10.1016/s0927-796x(97)00023-5

Crossref journal-article

Elsevier BV

Materials Science and Engineering: R: Reports (78)

Bibliography

Chaneliere, C., Autran, J. L., Devine, R. A. B., & Balland, B. (1998). Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications. Materials Science and Engineering: R: Reports, 22(6), 269â322.

Authors 4

C. Chaneliere (first)
J.L. Autran (additional)
R.A.B. Devine (additional)
B. Balland (additional)

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Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 6:43 p.m.)
Deposited	6 years, 4 months ago (April 18, 2019, 6:27 p.m.)
Indexed	30 minutes ago (Aug. 29, 2025, 11:30 a.m.)
Issued	27 years, 3 months ago (May 1, 1998)
Published	27 years, 3 months ago (May 1, 1998)
Published Print	27 years, 3 months ago (May 1, 1998)

Funders 0

None

BibTeX

@article{Chaneliere_1998, title={Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications}, volume={22}, ISSN={0927-796X}, url={http://dx.doi.org/10.1016/s0927-796x(97)00023-5}, DOI={10.1016/s0927-796x(97)00023-5}, number={6}, journal={Materials Science and Engineering: R: Reports}, publisher={Elsevier BV}, author={Chaneliere, C. and Autran, J.L. and Devine, R.A.B. and Balland, B.}, year={1998}, month=may, pages={269–322} }

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