DOI: 10.1016/s0927-0248(99)00044-6. Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films: The role of thickness-dependent roughness and porosity

Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films: The role of thickness-dependent roughness and porosity

10.1016/s0927-0248(99)00044-6

Crossref journal-article

Elsevier BV

Solar Energy Materials and Solar Cells (78)

Bibliography

GÃ³mez, M., RodrÄ±Ìguez, J., Tingry, S., Hagfeldt, A., Lindquist, S.-E., & Granqvist, C. G. (1999). Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films: The role of thickness-dependent roughness and porosity. Solar Energy Materials and Solar Cells, 59(3), 277â287.

Authors 6

M Gómez (first)
J Rodrı́guez (additional)
S Tingry (additional)
A Hagfeldt (additional)
S.-E Lindquist (additional)
C.G Granqvist (additional)

References 20 Referenced 17

S.-N. Chen, S.K. Deb, H. Witzke, U.S. Patent 4,080,488, 1978.
10.1038/353737a0 / Nature by O'Regan (1991)
10.1557/JMR.1997.0090 / J. Mater. Res. by Kasuga (1997)
10.1016/0927-0248(92)90091-3 / Solar Energy Mater. Solar Cells by Hagfeldt (1992)
10.1021/j100072a023 / J. Phys. Chem. by Södergren (1994)
10.1016/0960-1481(94)90361-1 / Renewable Energy by Grätzel (1994)
10.1021/jp962377q / J. Phys. Chem. B by Huang (1997)
10.1021/jp9624919 / J. Phys. Chem. B by Grünwald (1997)
10.1016/S0040-6090(98)01482-5 / Thin Solid Films by Gómez (1999)
{'key': '10.1016/S0927-0248(99)00044-6_BIB10', 'first-page': '521', 'article-title': 'Electrochemical Methods', 'author': 'Bard', 'year': '1980'} / Electrochemical Methods by Bard (1980)
{'key': '10.1016/S0927-0248(99)00044-6_BIB11', 'first-page': '6', 'article-title': 'Handbook of Sputter Deposition Technology', 'author': 'Wasa', 'year': '1992'} / Handbook of Sputter Deposition Technology by Wasa (1992)
{'key': '10.1016/S0927-0248(99)00044-6_BIB12', 'series-title': 'Handbook of Thin Film Process Technology', 'first-page': 'A5.0.1', 'author': 'Westwood', 'year': '1998'} / Handbook of Thin Film Process Technology by Westwood (1998)
10.1116/1.576604 / J. Vac. Sci. Technol. A by Nandra (1990)
10.1063/1.359140 / J. Appl. Phys. by Le Bellac (1995)
Powder Diffraction Files (Int. Center for Diffraction Data); files 21-1272 and 21-1276.
{'key': '10.1016/S0927-0248(99)00044-6_BIB16', 'series-title': 'Elements of X-ray Diffraction', 'author': 'Cullity', 'year': '1959'} / Elements of X-ray Diffraction by Cullity (1959)
Nanoscope III Command Reference Manual Version 3.0, Digital Instruments, Inc., Santa Barbara, 1993.
10.1021/j150644a008 / J. Phys. Chem. by Dominey (1983)
10.1002/hlca.19900730624 / Helv. Chim. Acta by Nazeeruddin (1990)
10.1021/cr00033a003 / Chem. Rev. by Hagfeldt (1995)

Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 5:27 a.m.)
Deposited	6 years, 4 months ago (April 29, 2019, 3:55 a.m.)
Indexed	2 years, 1 month ago (Aug. 2, 2023, 6:16 a.m.)
Issued	25 years, 11 months ago (Oct. 1, 1999)
Published	25 years, 11 months ago (Oct. 1, 1999)
Published Print	25 years, 11 months ago (Oct. 1, 1999)

Funders 0

None

BibTeX

@article{G_mez_1999, title={Photoelectrochemical effect in dye sensitized, sputter deposited Ti oxide films: The role of thickness-dependent roughness and porosity}, volume={59}, ISSN={0927-0248}, url={http://dx.doi.org/10.1016/s0927-0248(99)00044-6}, DOI={10.1016/s0927-0248(99)00044-6}, number={3}, journal={Solar Energy Materials and Solar Cells}, publisher={Elsevier BV}, author={Gómez, M and Rodrı́guez, J and Tingry, S and Hagfeldt, A and Lindquist, S.-E and Granqvist, C.G}, year={1999}, month=oct, pages={277–287} }

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