DOI: 10.1016/s0925-4005(99)00077-5. Preparation of nickel oxide thin films for gas sensors applications

Preparation of nickel oxide thin films for gas sensors applications

10.1016/s0925-4005(99)00077-5

Crossref journal-article

Elsevier BV

Sensors and Actuators B: Chemical (78)

Bibliography

Hotovy, I., Huran, J., Spiess, L., Hascik, S., & Rehacek, V. (1999). Preparation of nickel oxide thin films for gas sensors applications. Sensors and Actuators B: Chemical, 57(1â3), 147â152.

Authors 5

I Hotovy (first)
J Huran (additional)
L Spiess (additional)
S Hascik (additional)
V Rehacek (additional)

References 7 Referenced 187

10.1143/JJAP.35.L328 / Jpn. J. Appl. Phys. / Preferred orientation of NiO films prepared by plasma-enhanced metalorganic chemical vapor deposition by Fujii (1996)
10.1016/0040-6090(93)90636-4 / Thin Solid Films / Transparent conducting p-type NiO thin films prepared by magnetron sputtering by Sato (1993)
10.1143/JJAP.33.6656 / Jpn. J. Appl. Phys. / Preparation and electrochromic properties of Rf-sputtered NiOx films prepared in Ar/O2/H2 atmosphere by Kitao (1994)
10.1143/JJAP.34.2440 / Jpn. J. Appl. Phys. / Nickel oxide electrochromic thin films prepared by reactive DC magnetron sputtering by Yoshimura (1995)
10.1007/BF00274914 / J. Mater. Sci. Lett. / Preparation and characteristics of nickel oxide thin film by controlled growth with sequential surface chemical reactions by Kumagai (1996)
10.1143/JJAP.32.L1448 / Jpn. J. Appl. Phys. / NaCl-type oxide films prepared by plasma-enhanced matalorganic chemical vapor deposition by Fujii (1993)
I. Hotovy, J. Huran, J. Janik, A.P. Kobzev, Deposition and properties of nickel oxide films produced by DC reactive magnetron sputtering, Vacuum (1998) in press. (10.1016/S0042-207X(98)00190-0)

Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 8:56 p.m.)
Deposited	3 years, 2 months ago (July 3, 2022, 3:24 p.m.)
Indexed	1 month, 1 week ago (July 24, 2025, 7:37 a.m.)
Issued	26 years ago (Sept. 1, 1999)
Published	26 years ago (Sept. 1, 1999)
Published Print	26 years ago (Sept. 1, 1999)

Funders 0

None

BibTeX

@article{Hotovy_1999, title={Preparation of nickel oxide thin films for gas sensors applications}, volume={57}, ISSN={0925-4005}, url={http://dx.doi.org/10.1016/s0925-4005(99)00077-5}, DOI={10.1016/s0925-4005(99)00077-5}, number={1–3}, journal={Sensors and Actuators B: Chemical}, publisher={Elsevier BV}, author={Hotovy, I and Huran, J and Spiess, L and Hascik, S and Rehacek, V}, year={1999}, month=sep, pages={147–152} }

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