DOI: 10.1016/s0169-4332(96)00554-5. Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O

10.1016/s0169-4332(96)00554-5

Crossref journal-article

Elsevier BV

Applied Surface Science (78)

Bibliography

Aarik, J., Kukli, K., Aidla, A., & Pung, L. (1996). Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O. Applied Surface Science, 103(4), 331â341.

Authors 4

Jaan Aarik (first)
Kaupo Kukli (additional)
Aleks Aidla (additional)
Lembit Pung (additional)

References 37 Referenced 52

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Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 7:30 p.m.)
Deposited	6 years, 4 months ago (April 17, 2019, 9:26 p.m.)
Indexed	1 month, 2 weeks ago (July 20, 2025, 12:13 a.m.)
Issued	28 years, 9 months ago (Dec. 1, 1996)
Published	28 years, 9 months ago (Dec. 1, 1996)
Published Print	28 years, 9 months ago (Dec. 1, 1996)

Funders 0

None

BibTeX

@article{Aarik_1996, title={Mechanisms of suboxide growth and etching in atomic layer deposition of tantalum oxide from TaCl5 and H2O}, volume={103}, ISSN={0169-4332}, url={http://dx.doi.org/10.1016/s0169-4332(96)00554-5}, DOI={10.1016/s0169-4332(96)00554-5}, number={4}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Aarik, Jaan and Kukli, Kaupo and Aidla, Aleks and Pung, Lembit}, year={1996}, month=dec, pages={331–341} }

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