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Elsevier BV
Microelectronic Engineering (78)
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Stathis, J. H. (1997). Quantitative model of the thickness dependence of breakdown in ultra-thin oxides. Microelectronic Engineering, 36(1–4), 325–328.

Authors 1
  1. J.H. Stathis (first)
References 9 Referenced 39
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Dates
Type When
Created 23 years, 1 month ago (July 25, 2002, 4:57 a.m.)
Deposited 6 years, 3 months ago (April 29, 2019, 6:51 p.m.)
Indexed 11 months, 2 weeks ago (Sept. 6, 2024, 10:21 a.m.)
Issued 28 years, 2 months ago (June 1, 1997)
Published 28 years, 2 months ago (June 1, 1997)
Published Print 28 years, 2 months ago (June 1, 1997)
Funders 0

None

@article{Stathis_1997, title={Quantitative model of the thickness dependence of breakdown in ultra-thin oxides}, volume={36}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/s0167-9317(97)00074-9}, DOI={10.1016/s0167-9317(97)00074-9}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Stathis, J.H.}, year={1997}, month=jun, pages={325–328} }