DOI: 10.1016/s0167-9317(97)00015-4. Use of carbon-free Ta2O5 thin-films as a gate insulator

Use of carbon-free Ta2O5 thin-films as a gate insulator

10.1016/s0167-9317(97)00015-4

Crossref journal-article

Elsevier BV

Microelectronic Engineering (78)

Bibliography

Devine, R. A. B., Chaneliere, C., Autran, J. L., Balland, B., Paillet, P., & Leray, J. L. (1997). Use of carbon-free Ta2O5 thin-films as a gate insulator. Microelectronic Engineering, 36(1â4), 61â64.

Authors 6

R.A.B. Devine (first)
C. Chaneliere (additional)
J.L. Autran (additional)
B. Balland (additional)
P. Paillet (additional)
J.L. Leray (additional)

References 13 Referenced 26

{'key': '10.1016/S0167-9317(97)00015-4_BIB1', 'series-title': 'IEDM Tech. Dig.', 'first-page': '111', 'author': 'Ohji', 'year': '1995'} / IEDM Tech. Dig. by Ohji (1995)
{'key': '10.1016/S0167-9317(97)00015-4_BIB2', 'series-title': 'IEDM Tech. Dig.', 'first-page': '53', 'author': 'Kwon', 'year': '1993'} / IEDM Tech. Dig. by Kwon (1993)
{'key': '10.1016/S0167-9317(97)00015-4_BIB3', 'series-title': 'IEDM Tech. Dig.', 'first-page': '49', 'author': 'Kamiyama', 'year': '1993'} / IEDM Tech. Dig. by Kamiyama (1993)
{'key': '10.1016/S0167-9317(97)00015-4_BIB4', 'series-title': "Proc. INFOS'91 Conf.", 'first-page': '99', 'author': 'Burte', 'year': '1991'} / Proc. INFOS'91 Conf. by Burte (1991)
10.1016/0026-2692(93)90048-J / Microelectron. J. by Rausch (1993)
{'key': '10.1016/S0167-9317(97)00015-4_BIB6', 'series-title': 'IEDM Tech. Dig.', 'first-page': '333', 'author': 'Sun', 'year': '1994'} / IEDM Tech. Dig. by Sun (1994)
10.1063/1.116663 / Appl. Phys. Lett. by Devine (1996)
10.1007/BF00368923 / J. Mat. Sci. by Moon (1994)
10.1016/0924-4247(95)01060-2 / Sensors and Actuators by Autran (1995)
{'key': '10.1016/S0167-9317(97)00015-4_BIB10', 'author': 'Autran', 'year': '1997', 'journal-title': 'IEEE Electron Device Lett.'} / IEEE Electron Device Lett. by Autran (1997)
10.1063/1.96974 / Appl. Phys. Lett. by McWhorter (1986)
10.1109/T-ED.1984.21472 / IEEE Trans. Electron Dev. by Groeseneken (1984)
10.1063/1.354493 / J. Appl. Phys. by Autran (1994)

Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 8:57 a.m.)
Deposited	6 years, 3 months ago (April 29, 2019, 10:51 p.m.)
Indexed	11 months, 3 weeks ago (Sept. 6, 2024, 10:19 a.m.)
Issued	28 years, 2 months ago (June 1, 1997)
Published	28 years, 2 months ago (June 1, 1997)
Published Print	28 years, 2 months ago (June 1, 1997)

Funders 0

None

BibTeX

@article{Devine_1997, title={Use of carbon-free Ta2O5 thin-films as a gate insulator}, volume={36}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/s0167-9317(97)00015-4}, DOI={10.1016/s0167-9317(97)00015-4}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Devine, R.A.B. and Chaneliere, C. and Autran, J.L. and Balland, B. and Paillet, P. and Leray, J.L.}, year={1997}, month=jun, pages={61–64} }

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