DOI: 10.1016/s0167-9317(97)00007-5. Reliability and integration of ultra-thin gate dielectrics for advanced CMOS

Reliability and integration of ultra-thin gate dielectrics for advanced CMOS

10.1016/s0167-9317(97)00007-5

Crossref journal-article

Elsevier BV

Microelectronic Engineering (78)

Bibliography

Buchanan, D. A., & Lo, S.-H. (1997). Reliability and integration of ultra-thin gate dielectrics for advanced CMOS. Microelectronic Engineering, 36(1â4), 13â20.

Authors 2

D.A. Buchanan (first)
S.-H. Lo (additional)

References 3 Referenced 85

{'key': '10.1016/S0167-9317(97)00007-5_BIB1', 'first-page': '593', 'author': 'Momose', 'year': '1994', 'journal-title': 'IEDM Tech. Dig.'} / IEDM Tech. Dig. by Momose (1994)
{'key': '10.1016/S0167-9317(97)00007-5_BIB2', 'first-page': '1233', 'volume': '43', 'author': 'Momose', 'year': '1995', 'journal-title': 'IEEE Trans. on Elect. Dev.'} / IEEE Trans. on Elect. Dev. by Momose (1995)
10.1103/PhysRevB.5.4891 / Phys. Rev B by Stern (1972)

Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 7:25 a.m.)
Deposited	6 years, 4 months ago (April 26, 2019, 10:57 p.m.)
Indexed	1 day, 16 hours ago (Aug. 29, 2025, 6:41 a.m.)
Issued	28 years, 2 months ago (June 1, 1997)
Published	28 years, 2 months ago (June 1, 1997)
Published Print	28 years, 2 months ago (June 1, 1997)

Funders 0

None

BibTeX

@article{Buchanan_1997, title={Reliability and integration of ultra-thin gate dielectrics for advanced CMOS}, volume={36}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/s0167-9317(97)00007-5}, DOI={10.1016/s0167-9317(97)00007-5}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Buchanan, D.A. and Lo, S.-H.}, year={1997}, month=jun, pages={13–20} }

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