10.1016/s0167-5729(02)00113-9
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de Almeida, R. M. C., & Baumvol, I. J. R. (2003). Reaction–diffusion in high-k dielectrics on Si. Surface Science Reports, 49(1–3), 1–114.

Authors 2
  1. R.M.C. de Almeida (first)
  2. I.J.R. Baumvol (additional)
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Dates
Type When
Created 22 years, 6 months ago (Feb. 17, 2003, 4:25 p.m.)
Deposited 5 years, 5 months ago (March 12, 2020, 12:14 p.m.)
Indexed 1 year, 2 months ago (June 16, 2024, 4:33 p.m.)
Issued 22 years, 7 months ago (Feb. 1, 2003)
Published 22 years, 7 months ago (Feb. 1, 2003)
Published Print 22 years, 7 months ago (Feb. 1, 2003)
Funders 0

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@article{de_Almeida_2003, title={Reaction–diffusion in high-k dielectrics on Si}, volume={49}, ISSN={0167-5729}, url={http://dx.doi.org/10.1016/s0167-5729(02)00113-9}, DOI={10.1016/s0167-5729(02)00113-9}, number={1–3}, journal={Surface Science Reports}, publisher={Elsevier BV}, author={de Almeida, R.M.C. and Baumvol, I.J.R.}, year={2003}, month=feb, pages={1–114} }