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Thin Solid Films (78)
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Hatchard, T. D., Dahn, J. R., Trussler, S., Fleischauer, M., Bonakdarpour, A., Mueller-Neuhaus, J. R., & Hewitt, K. C. (2003). The amorphous range in sputtered Si–Al–Sn films. Thin Solid Films, 443(1–2), 144–150.

Authors 7
  1. T.D. Hatchard (first)
  2. J.R. Dahn (additional)
  3. S. Trussler (additional)
  4. M. Fleischauer (additional)
  5. A. Bonakdarpour (additional)
  6. J.R. Mueller-Neuhaus (additional)
  7. K.C. Hewitt (additional)
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Dates
Type When
Created 21 years, 11 months ago (Sept. 16, 2003, 8:08 p.m.)
Deposited 6 years, 5 months ago (Feb. 23, 2019, 3:55 p.m.)
Indexed 1 year, 10 months ago (Oct. 15, 2023, 11:12 a.m.)
Issued 21 years, 10 months ago (Oct. 1, 2003)
Published 21 years, 10 months ago (Oct. 1, 2003)
Published Print 21 years, 10 months ago (Oct. 1, 2003)
Funders 0

None

@article{Hatchard_2003, title={The amorphous range in sputtered Si–Al–Sn films}, volume={443}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/s0040-6090(03)01093-9}, DOI={10.1016/s0040-6090(03)01093-9}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hatchard, T.D. and Dahn, J.R. and Trussler, S. and Fleischauer, M. and Bonakdarpour, A. and Mueller-Neuhaus, J.R. and Hewitt, K.C.}, year={2003}, month=oct, pages={144–150} }