DOI: 10.1016/s0040-6090(03)00502-9. Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors

10.1016/s0040-6090(03)00502-9

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Hausmann, D. M., de Rouffignac, P., Smith, A., Gordon, R., & Monsma, D. (2003). Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors. Thin Solid Films, 443(1â2), 1â4.

Authors 5

Dennis M. Hausmann (first)
Philippe de Rouffignac (additional)
Amethyst Smith (additional)
Roy Gordon (additional)
Douwe Monsma (additional)

References 11 Referenced 61

10.1016/S0927-796X(97)00023-5 / Mater. Sci. Eng., R by Chaneliere (1998)
H. Reisinger, G. Steinesberger, S. Jakschik, M. Getsche, T. Hecht, M. Leonhard, U. Schröder, H. Seidl, D. Schumann, IEEE Electron Devices Society Meeting, Washington, DC, USA, December 5–7, 2001, Digest International Electron Devices Meeting (2001) 12.2.1 (10.1109/IEDM.2001.979481)
M. Gutsche, H. Seidl, J. Luetzen, A. Birner, T. Hecht, S. Jakschik, M. Kerber, M. Leonhardt, P. Moll, T. Pompl, H, Reisinger, S. Rongen, A. Saenger, U. Schroeder, B. Sell, A. Wahl and D. Schumann, IEEE Electron Devices Society Meeting, Washington, DC, USA, December 5–7, 2001, Digest International Electron Devices Meeting (2001) 18.6.1 (10.1109/IEDM.2001.979524)
10.1051/jp4:19998106 / J. Phys. IV France by Leskela (1999)
10.1149/1.2048637 / J. Electrochem. Soc. by Kukli (1995)
10.1063/1.92274 / Appl. Phys. Lett. by Pessa (1981)
10.1021/cm001086y / Chem. Mater. by Kukli (2001)
10.1021/cm001017j / Chem. Mater. by Kukli (2000)
10.1039/J19690000980 / J. Chem. Soc. (A) by Bradley (1969)
10.1143/JJAP.33.6291 / Jpn. J. Appl. Phys. by Koyama (1994)
10.1143/JJAP.40.4593 / Jpn. J. Appl. Phys. by Lai (2001)

Dates

Type	When
Created	21 years, 11 months ago (Sept. 3, 2003, 12:31 p.m.)
Deposited	6 years, 6 months ago (Feb. 25, 2019, 5:25 a.m.)
Indexed	4 months, 3 weeks ago (April 4, 2025, 10:03 a.m.)
Issued	21 years, 10 months ago (Oct. 1, 2003)
Published	21 years, 10 months ago (Oct. 1, 2003)
Published Print	21 years, 10 months ago (Oct. 1, 2003)

Funders 0

None

BibTeX

@article{Hausmann_2003, title={Highly conformal atomic layer deposition of tantalum oxide using alkylamide precursors}, volume={443}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/s0040-6090(03)00502-9}, DOI={10.1016/s0040-6090(03)00502-9}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Hausmann, Dennis M. and de Rouffignac, Philippe and Smith, Amethyst and Gordon, Roy and Monsma, Douwe}, year={2003}, month=oct, pages={1–4} }

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