DOI: 10.1016/s0040-6090(00)01818-6. Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films

10.1016/s0040-6090(00)01818-6

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Liu, H.-D., Zhao, Y.-P., Ramanath, G., Murarka, S. P., & Wang, G.-C. (2001). Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films. Thin Solid Films, 384(1), 151â156.

Authors 5

H.-D Liu (first)
Y.-P Zhao (additional)
G Ramanath (additional)
S.P Murarka (additional)
G.-C Wang (additional)

References 42 Referenced 229

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Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 3:50 p.m.)
Deposited	6 years, 4 months ago (April 22, 2019, 1:58 a.m.)
Indexed	6 hours, 19 minutes ago (Aug. 29, 2025, 6:05 a.m.)
Issued	24 years, 5 months ago (March 1, 2001)
Published	24 years, 5 months ago (March 1, 2001)
Published Print	24 years, 5 months ago (March 1, 2001)

Funders 0

None

BibTeX

@article{Liu_2001, title={Thickness dependent electrical resistivity of ultrathin (<40 nm) Cu films}, volume={384}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/s0040-6090(00)01818-6}, DOI={10.1016/s0040-6090(00)01818-6}, number={1}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Liu, H.-D and Zhao, Y.-P and Ramanath, G and Murarka, S.P and Wang, G.-C}, year={2001}, month=mar, pages={151–156} }

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  "references-count": 42,
  "journal-issue": {
    "issue": "1",
    "published-print": {
      "date-parts": [
        [
          2001,
          3
        ]
      ]
    }
  },
  "alternative-id": [
    "S0040609000018186"
  ],
  "URL": "http://dx.doi.org/10.1016/S0040-6090(00)01818-6",
  "relation": {},
  "ISSN": [
    "0040-6090"
  ],
  "subject": [],
  "container-title-short": "Thin Solid Films",
  "published": {
    "date-parts": [
      [
        2001,
        3
      ]
    ]
  }
}