DOI: 10.1016/s0039-6028(87)80037-7. Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study

Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study

10.1016/s0039-6028(87)80037-7

Crossref journal-article

Elsevier BV

Surface Science (78)

Bibliography

Dâevelyn, M. P., Nelson, M. M., & Engel, T. (1987). Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study. Surface Science, 186(1â2), 75â114.

Authors 3

Mark P. D'evelyn (first)
Mark M. Nelson (additional)
Thomas Engel (additional)

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Dates

Type	When
Created	19 years ago (Aug. 2, 2006, 6:32 a.m.)
Deposited	6 years, 7 months ago (Jan. 14, 2019, 6:27 a.m.)
Indexed	4 months, 2 weeks ago (April 16, 2025, 8:05 a.m.)
Issued	38 years, 1 month ago (July 1, 1987)
Published	38 years, 1 month ago (July 1, 1987)
Published Print	38 years, 1 month ago (July 1, 1987)

Funders 0

None

BibTeX

@article{D_evelyn_1987, title={Kinetics of the adsorption of O2 and of the desorption of SiO on Si(100): A molecular beam, XPS, and ISS study}, volume={186}, ISSN={0039-6028}, url={http://dx.doi.org/10.1016/s0039-6028(87)80037-7}, DOI={10.1016/s0039-6028(87)80037-7}, number={1–2}, journal={Surface Science}, publisher={Elsevier BV}, author={D’evelyn, Mark P. and Nelson, Mark M. and Engel, Thomas}, year={1987}, month=jul, pages={75–114} }

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