DOI: 10.1016/s0030-3992(03)00052-5. ArF-excimer-laser annealing of 3C–SiC films—diode characteristics and numerical simulation

ArF-excimer-laser annealing of 3C–SiC films—diode characteristics and numerical simulation

10.1016/s0030-3992(03)00052-5

Crossref journal-article

Elsevier BV

Optics & Laser Technology (78)

Bibliography

Mizunami, T., & Toyama, N. (2003). ArF-excimer-laser annealing of 3CâSiC filmsâdiode characteristics and numerical simulation. Optics & Laser Technology, 35(6), 451â456.

Authors 2

T. Mizunami (first)
N. Toyama (additional)

References 27 Referenced 8

10.1063/1.102735 / Appl Phys Lett by Chou (1990)
10.1063/1.114108 / Appl Phys Lett by Ahmed (1995)
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10.1016/S0169-4332(01)00518-9 / Appl Surf Sci by Dutto (2001)
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{'issue': '2', 'key': '10.1016/S0030-3992(03)00052-5_BIB6', 'first-page': '188', 'volume': '70', 'author': 'Nakashima', 'year': '2001', 'journal-title': 'Oyo Butsuri'} / Oyo Butsuri by Nakashima (2001)
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10.1016/0022-3093(96)00081-6 / J Non-Cryst Solids by Lau (1996)
10.1143/JJAP.35.1648 / Jpn J Appl Phys 1 by Choi (1996)
10.1103/PhysRev.187.1041 / Phys Rev by Choyke (1969)
10.1143/JJAP.37.94 / Jpn J Appl Phys 1 by Mizunami (1998)
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{'issue': 'Suppl 1', 'key': '10.1016/S0030-3992(03)00052-5_BIB15', 'first-page': '634', 'article-title': 'JANAF thermochemical tables', 'volume': '14', 'author': 'Chase', 'year': '1985', 'journal-title': 'J Phys Chem Ref Data'} / J Phys Chem Ref Data / JANAF thermochemical tables by Chase (1985)
{'key': '10.1016/S0030-3992(03)00052-5_BIB16', 'first-page': '623', 'volume': '264–268', 'author': 'Muller St', 'year': '1989', 'journal-title': 'Mater Sci Forum'} / Mater Sci Forum by Muller St (1989)
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10.1063/1.90569 / Appl Phys Lett by Schultz (1979)
{'issue': '2', 'key': '10.1016/S0030-3992(03)00052-5_BIB23', 'first-page': '202', 'volume': '41', 'author': 'Tanabe', 'year': '2000', 'journal-title': 'NEC Res Dev'} / NEC Res Dev by Tanabe (2000)
10.1143/JJAP.32.6190 / Jpn J Appl Phys 1 by Kuriyama (1993)
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10.1103/PhysRevB.23.5551 / Phys Rev B by Wautelet (1981)

Dates

Type	When
Created	22 years, 3 months ago (April 30, 2003, 8:30 p.m.)
Deposited	6 years, 5 months ago (March 21, 2019, 1:58 p.m.)
Indexed	2 years, 1 month ago (July 31, 2023, 4:50 a.m.)
Issued	21 years, 11 months ago (Sept. 1, 2003)
Published	21 years, 11 months ago (Sept. 1, 2003)
Published Print	21 years, 11 months ago (Sept. 1, 2003)

Funders 0

None

BibTeX

@article{Mizunami_2003, title={ArF-excimer-laser annealing of 3C–SiC films—diode characteristics and numerical simulation}, volume={35}, ISSN={0030-3992}, url={http://dx.doi.org/10.1016/s0030-3992(03)00052-5}, DOI={10.1016/s0030-3992(03)00052-5}, number={6}, journal={Optics & Laser Technology}, publisher={Elsevier BV}, author={Mizunami, T. and Toyama, N.}, year={2003}, month=sep, pages={451–456} }

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