DOI: 10.1016/0924-4247(94)85031-3. SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures

SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures

10.1016/0924-4247(94)85031-3

Crossref journal-article

Elsevier BV

Sensors and Actuators A: Physical (78)

Bibliography

Shaw, K. A., Zhang, Z. L., & MacDonald, N. C. (1994). SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures. Sensors and Actuators A: Physical, 40(1), 63â70.

Authors 3

Kevin A. Shaw (first)
Z.Lisa Zhang (additional)
Noel C. MacDonald (additional)

References 13 Referenced 222

{'key': '10.1016/0924-4247(94)85031-3_BIB1', 'article-title': 'Pin joints, gears, springs, cranks, and other novel micromechanical structures', 'author': 'Fan', 'year': '251987', 'journal-title': "Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan"} / Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan / Pin joints, gears, springs, cranks, and other novel micromechanical structures by Fan (251987)
10.1016/0250-6874(89)87098-2 / Sensors and Actuators / Laterally driven polysilicon resonant microstructures by Tang (1989)
10.1016/0250-6874(89)87109-4 / Sensors and Actuators / Fabrication of micromechanical devices from polysilicon films with smooth surfaces by Guckel (1989)
10.1088/0960-1317/2/3/003 / J. Micromech. Microeng. / Review: surface micromachining by Linder (1992)
10.1109/PROC.1982.12331 / Proc. IEEE / Silicon as a mechanical material by Peterson (1982)
10.1109/T-ED.1978.19249 / IEEE Trans. Electron Devices / Fabrication of novel three-dimensional structures by anisotropic etching of (100) and (110) silicon by Bassous (1978)
10.1149/1.2129289 / J. Electrochem. Soc. / The controlled etching of silicon in catalysed ethylene diamine-pyrocatechol-water solutions by Reisman (1979)
{'key': '10.1016/0924-4247(94)85031-3_BIB8', 'article-title': 'The mechanism of anisotropic silicon etching and its relevance for micromachining', 'author': 'Seidel', 'year': '251987', 'journal-title': "Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan"} / Proc. 4th Int. Conf. Solid-State Sensors and Actuators (Transducers '87), Tokyo, Japan / The mechanism of anisotropic silicon etching and its relevance for micromachining by Seidel (251987)
{'key': '10.1016/0924-4247(94)85031-3_BIB9', 'article-title': 'Three-dimensional micro-clectro-mechanical devices: simulation and fabrication', 'author': 'Zhang', 'year': '1991'} / Three-dimensional micro-clectro-mechanical devices: simulation and fabrication by Zhang (1991)
10.1088/0960-1317/2/1/007 / J. Micromech. Microeng. / A RIE process for submicron silicon electromechanical structures by Zhang (1992)
{'key': '10.1016/0924-4247(94)85031-3_BIB11', 'article-title': 'SCREAM I: a single-crystal silicon, single mask, reactive ion etching process for microclectromechanical systems', 'author': 'Shaw', 'year': '1993'} / SCREAM I: a single-crystal silicon, single mask, reactive ion etching process for microclectromechanical systems by Shaw (1993)
{'key': '10.1016/0924-4247(94)85031-3_BIB12', 'first-page': '72', 'article-title': 'Submicron, movable gallium arsenide mechanical structures and actuators', 'author': 'Zhang', 'year': '1992', 'journal-title': "IEEE MEMS '92, Travemunde, Germany"} / IEEE MEMS '92, Travemunde, Germany / Submicron, movable gallium arsenide mechanical structures and actuators by Zhang (1992)
{'key': '10.1016/0924-4247(94)85031-3_BIB13', 'first-page': '210', 'article-title': 'A single-mask lateral accelerometer', 'author': 'Shaw', 'year': '7101993', 'journal-title': "Proc. 7th Int. Conf. Solid-State Sensors and actuators, (Transducers '93), Yokohama, Japan"} / Proc. 7th Int. Conf. Solid-State Sensors and actuators, (Transducers '93), Yokohama, Japan / A single-mask lateral accelerometer by Shaw (7101993)

Dates

Type	When
Created	23 years ago (July 25, 2002, 5:03 a.m.)
Deposited	3 years, 6 months ago (Feb. 11, 2022, 8:10 a.m.)
Indexed	4 weeks, 2 days ago (July 24, 2025, 7:35 a.m.)
Issued	31 years, 7 months ago (Jan. 1, 1994)
Published	31 years, 7 months ago (Jan. 1, 1994)
Published Print	31 years, 7 months ago (Jan. 1, 1994)

Funders 0

None

BibTeX

@article{Shaw_1994, title={SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures}, volume={40}, ISSN={0924-4247}, url={http://dx.doi.org/10.1016/0924-4247(94)85031-3}, DOI={10.1016/0924-4247(94)85031-3}, number={1}, journal={Sensors and Actuators A: Physical}, publisher={Elsevier BV}, author={Shaw, Kevin A. and Zhang, Z.Lisa and MacDonald, Noel C.}, year={1994}, month=jan, pages={63–70} }

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