DOI: 10.1016/0924-4247(94)00969-o. Micromechanics compatible with an 0.8 μm CMOS process

Micromechanics compatible with an 0.8 μm CMOS process

10.1016/0924-4247(94)00969-o

Crossref journal-article

Elsevier BV

Sensors and Actuators A: Physical (78)

Bibliography

Biebl, M., Scheiter, T., Hierold, C., Philipsborn, H. v., & Klose, H. (1995). Micromechanics compatible with an 0.8 Î¼m CMOS process. Sensors and Actuators A: Physical, 47(1â3), 593â597.

Authors 5

M. Biebl (first)
T. Scheiter (additional)
C. Hierold (additional)
H.v. Philipsborn (additional)
H. Klose (additional)

References 10 Referenced 25

{'key': '10.1016/0924-4247(94)00969-O_BIB1', 'first-page': '39', 'article-title': 'Fabrication technology for an integrated surface-micromachined sensor', 'volume': '36', 'author': 'Core', 'year': '1993', 'journal-title': 'Solid State Technol.'} / Solid State Technol. / Fabrication technology for an integrated surface-micromachined sensor by Core (1993)
10.1016/0250-6874(89)87109-4 / Sensors and Actuators / Fabrication of micromechanical devices from polysilicon films with smooth surfaces by Guckel (1989)
10.1016/0250-6874(89)87080-5 / Sensors and Actuators / A new approach for the fabrication of micromechanical structures by Parameswaran (1989)
H. Guckel, J.J. Sniegowski and T.R. Christenson, Advances in processing techniques for silicon micromechanical devices with smooth surfaces, Proc. IEEE Micro Electro Mechanical Systems, Salt Lake City, UT, USA, June 6–9, 1989, pp. 71-75 (10.1109/MEMSYS.1989.77964)
10.1016/0924-4247(93)00654-M / Sensors and Actuators A / Stiction of surface micromachined structures after rinsing and drying: model and investigation of adhesion mechanisms by Legtenberg (1994)
{'key': '10.1016/0924-4247(94)00969-O_BIB6', 'first-page': '134', 'article-title': 'Micro-mechanical sensors using encapsulated built-in resonant strain gauges', 'author': 'Tilmans', 'year': '1993'} / Micro-mechanical sensors using encapsulated built-in resonant strain gauges by Tilmans (1993)
N. Takeshima, K.J. Gabriel, M. Ozaki, J. Takahasji, H. Horiguchi and H. Fujita, Electrostatic parallelogram actuators, Proc. 6th Int. Conf. Solid-State Sensors and Actuators (Transducers '91), San Francisco, CA, USA, June 24–28, 1991, pp. 63-66 (10.1109/SENSOR.1991.148800)
D. Kobayashi, T. Hirano, T. Furuhata and H. Fujita, An integrated lateral tunneling unit. Proc. IEEE Micro Electro Mechanical Systems, Travemünde, Germany, Feb. 4–7, 1992, pp. 214-219 (10.1109/MEMSYS.1992.187720)
L. Fan, R.S. Muller, W. Yun, R.T. Howe and J. Huang, Spiral microstructures for the measurement of average strain gradients in thin films, Proc. IEEE Micro Electro Mechanical Systems, Napa Valley, CA, USA, Feb. 11–14, 1990, pp. 177-181 (10.1109/MEMSYS.1990.110272)
H. Guckel, D.W. Burns, H.A.C. Tilmans, D.W. DeRoo and C.R. Rutigliano, Mechanical properties of fine-grained polysilicon - the repeatability issue, Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC, USA, 6–9 June, 1988, pp. 96-99 (10.1109/SOLSEN.1988.26442)

Dates

Type	When
Created	23 years, 1 month ago (July 25, 2002, 11:54 a.m.)
Deposited	6 years, 4 months ago (April 26, 2019, 1:20 p.m.)
Indexed	2 months ago (June 24, 2025, 7:43 a.m.)
Issued	30 years, 5 months ago (March 1, 1995)
Published	30 years, 5 months ago (March 1, 1995)
Published Print	30 years, 5 months ago (March 1, 1995)

Funders 0

None

BibTeX

@article{Biebl_1995, title={Micromechanics compatible with an 0.8 μm CMOS process}, volume={47}, ISSN={0924-4247}, url={http://dx.doi.org/10.1016/0924-4247(94)00969-o}, DOI={10.1016/0924-4247(94)00969-o}, number={1–3}, journal={Sensors and Actuators A: Physical}, publisher={Elsevier BV}, author={Biebl, M. and Scheiter, T. and Hierold, C. and Philipsborn, H.v. and Klose, H.}, year={1995}, month=mar, pages={593–597} }

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