DOI: 10.1016/0169-4332(89)90906-9. Low temperature oxidation of crystalline silicon using excimer laser irradiation

Low temperature oxidation of crystalline silicon using excimer laser irradiation

10.1016/0169-4332(89)90906-9

Crossref journal-article

Elsevier BV

Applied Surface Science (78)

Bibliography

Nayar, V., Boyd, I. W., Goodall, F. N., & Arthur, G. (1989). Low temperature oxidation of crystalline silicon using excimer laser irradiation. Applied Surface Science, 36(1â4), 134â140.

Authors 4

Vishal Nayar (first)
Ian W. Boyd (additional)
F.N. Goodall (additional)
G. Arthur (additional)

References 11 Referenced 14

{'key': '10.1016/0169-4332(89)90906-9_BIB1', 'series-title': 'Laser Processing of Thin Films and Microstructures', 'author': 'Boyd', 'year': '1987'} / Laser Processing of Thin Films and Microstructures by Boyd (1987)
10.1116/1.571669 / J. Vacuum Sci. Technol. by Schafer (1982)
10.1063/1.97825 / Appl. Phys. Letters by Young (1987)
10.1080/13642818708211207 / Phil. Mag. B by Fogarassy (1987)
10.1149/1.2115321 / J. Electrochem. Soc. by Taft (1984)
10.1080/13642818708211200 / Phil. Mag. B by Irene (1987)
10.1063/1.99676 / Appl. Phys. Letters by Hoff (1988)
10.1364/JOSAB.3.000812 / J. Opt. Soc. Am. B by Ong (1986)
10.1103/PhysRevB.34.2346 / Phys. Rev. B by Berti (1986)
10.1007/BF00617943 / Appl. Phys. A by Foulon (1988)
{'key': '10.1016/0169-4332(89)90906-9_BIB11', 'series-title': 'Proc. Short Meeting Series 10', 'article-title': 'Advanced Lithography', 'author': 'Goodall', 'year': '1988'} / Proc. Short Meeting Series 10 / Advanced Lithography by Goodall (1988)

Dates

Type	When
Created	22 years, 10 months ago (Oct. 21, 2002, 2:05 p.m.)
Deposited	6 years, 4 months ago (April 8, 2019, 4:23 a.m.)
Indexed	1 year, 7 months ago (Feb. 3, 2024, 9 a.m.)
Issued	36 years, 8 months ago (Jan. 1, 1989)
Published	36 years, 8 months ago (Jan. 1, 1989)
Published Print	36 years, 8 months ago (Jan. 1, 1989)

Funders 0

None

BibTeX

@article{Nayar_1989, title={Low temperature oxidation of crystalline silicon using excimer laser irradiation}, volume={36}, ISSN={0169-4332}, url={http://dx.doi.org/10.1016/0169-4332(89)90906-9}, DOI={10.1016/0169-4332(89)90906-9}, number={1–4}, journal={Applied Surface Science}, publisher={Elsevier BV}, author={Nayar, Vishal and Boyd, Ian W. and Goodall, F.N. and Arthur, G.}, year={1989}, month=jan, pages={134–140} }

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