Crossref journal-article
Elsevier BV
Microelectronic Engineering (78)
Bibliography

Young, R. J., Cleaver, J. R. A., & Ahmed, H. (1990). Gas-assisted focused ion beam etching for microfabrication and inspection. Microelectronic Engineering, 11(1–4), 409–412.

Authors 3
  1. R.J. Young (first)
  2. J.R.A. Cleaver (additional)
  3. H. Ahmed (additional)
References 10 Referenced 21
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  4. {'key': '10.1016/0167-9317(90)90140-O_BIB4', 'article-title': 'Microscopy of Semiconductor Materials', 'author': 'Kirk', 'year': '1989', 'journal-title': 'Inst. Phys. Conf. Ser.'} / Inst. Phys. Conf. Ser. / Microscopy of Semiconductor Materials by Kirk (1989)
  5. 10.1063/1.97677 / Appl. Phys. Lett. by Takado (1987)
  6. R.C. Weast (ed.), Chemistry and Physics Tables, CRC Press, 56th Edition.
  7. 10.1007/BF01729909 / J. Mat. Sci. Lett. by Franklin (1988)
  8. 10.1088/0022-3719/21/14/009 / J. Phys. C: Solid State Phys. by Fletcher (1988)
  9. J.F. Gibbons, W.S. Johnson and S.W. Mylroie, Projected Range Statistics (Semiconductors and Related Materials, 2nd Edition).
  10. 10.1063/1.98970 / Appl. Phys. Lett. by Scherer (1987)
Dates
Type When
Created 22 years, 10 months ago (Oct. 16, 2002, 9:41 p.m.)
Deposited 6 years, 4 months ago (April 7, 2019, 7:21 a.m.)
Indexed 1 year, 7 months ago (Feb. 3, 2024, 1:19 a.m.)
Issued 35 years, 5 months ago (April 1, 1990)
Published 35 years, 5 months ago (April 1, 1990)
Published Print 35 years, 5 months ago (April 1, 1990)
Funders 0

None

@article{Young_1990, title={Gas-assisted focused ion beam etching for microfabrication and inspection}, volume={11}, ISSN={0167-9317}, url={http://dx.doi.org/10.1016/0167-9317(90)90140-o}, DOI={10.1016/0167-9317(90)90140-o}, number={1–4}, journal={Microelectronic Engineering}, publisher={Elsevier BV}, author={Young, R.J. and Cleaver, J.R.A. and Ahmed, H.}, year={1990}, month=apr, pages={409–412} }