Crossref
journal-article
Elsevier BV
Thin Solid Films (78)
References
25
Referenced
99
{'key': '10.1016/0040-6090(89)90445-8_BIB1', 'first-page': '31', 'volume': 'Vol. I', 'author': 'Kubiak', 'year': '1988'}
by Kubiak (1988)10.1103/PhysRevLett.57.249
/ Phys. Rev. Lett. by Yablonovitch (1986)10.1063/1.100053
/ Appl. Phys. Lett. by Burrows (1988)10.1116/1.575980
/ J. Vac. Sci. Technol. by Chabal (1989)10.1007/BF00616822
/ Appl. Phys. A by Grunder (1986){'key': '10.1016/0040-6090(89)90445-8_BIB6', 'series-title': 'AIP Conf. Proc. No. 167', 'first-page': '329', 'article-title': 'Deposition and Growth Limits for Microelectronics', 'author': 'Grundner', 'year': '1988'}
/ AIP Conf. Proc. No. 167 / Deposition and Growth Limits for Microelectronics by Grundner (1988)10.1149/1.2134225
/ J. Electrochem. Soc. by Raider (1975){'key': '10.1016/0040-6090(89)90445-8_BIB8', 'first-page': '375', 'volume': 'Vol. 88-8', 'author': 'Grunthaner', 'year': '1988'}
by Grunthaner (1988)10.1116/1.575372
/ J. Vac. Sci. Technol. by Kaiser (1988)10.1016/0039-6028(87)90141-5
/ Surf. Sci. by Kaiser (1987)10.1063/1.338215
/ J. Appl. Phys. by Grunthaner (1987)10.1063/1.94565
/ Appl. Phys. Lett. by Hollinger (1984)10.1103/PhysRevB.30.764
/ Phys. Rev. by McFeely (1984)10.1016/0038-1098(82)90972-3
/ Solid State Commun. by Ibach (1982){'key': '10.1016/0040-6090(89)90445-8_BIB16', 'first-page': '169', 'volume': 'Vol. 131', 'author': 'George', 'year': '1989'}
by George (1989)- D.B. Fenner, D.K. Biegelsen and R.D. Bringans, J. Appl. Phys., to appear in 1 July 89 issue.
10.1149/1.2108651
/ J. Electrochem. Soc. by Ishizaka (1986)10.1063/1.336014
/ J. Appl. Phys. by Yang (1985){'key': '10.1016/0040-6090(89)90445-8_BIB21', 'first-page': '1095', 'volume': 'A4', 'author': 'Kubiak', 'year': '1986', 'journal-title': 'J. Vac. Sci. Technol.'}
/ J. Vac. Sci. Technol. by Kubiak (1986)10.1103/PhysRevLett.56.608
/ Phys. Rev. Lett. by Feenstra (1986)10.1016/0039-6028(87)90170-1
/ Surf. Sci. by Feenstra (1987){'key': '10.1016/0040-6090(89)90445-8_BIB24', 'first-page': '726', 'volume': '55', 'author': 'Binnig', 'year': '1982', 'journal-title': 'Helv. Phys. Acta.'}
/ Helv. Phys. Acta. by Binnig (1982){'key': '10.1016/0040-6090(89)90445-8_BIB25', 'series-title': 'The Physics and Chemistry of SiO2 and the Si\ue5f8SiO2 Interface', 'first-page': '401', 'author': 'Hahn', 'year': '1988'}
/ The Physics and Chemistry of SiO2 and the SiSiO2 Interface by Hahn (1988)10.1103/PhysRevLett.55.2332
/ Phys. Rev. Lett. by Tromp (1985)10.1063/1.96582
/ Appl. Phys. Lett. by Xie (1986)
Dates
Type | When |
---|---|
Created | 22 years, 10 months ago (Oct. 18, 2002, 4:06 p.m.) |
Deposited | 6 years, 4 months ago (April 5, 2019, 4:21 a.m.) |
Indexed | 1 year, 6 months ago (Feb. 4, 2024, 9:43 a.m.) |
Issued | 35 years, 8 months ago (Dec. 1, 1989) |
Published | 35 years, 8 months ago (Dec. 1, 1989) |
Published Print | 35 years, 8 months ago (Dec. 1, 1989) |
@article{Grunthaner_1989, title={Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy}, volume={183}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/0040-6090(89)90445-8}, DOI={10.1016/0040-6090(89)90445-8}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Grunthaner, P.J. and Grunthaner, F.J. and Fathauer, R.W. and Lin, T.L. and Hecht, M.H. and Bell, L.D. and Kaiser, W.J. and Schowengerdt, F.D. and Mazur, J.H.}, year={1989}, month=dec, pages={197–212} }