Crossref journal-article
Elsevier BV
Thin Solid Films (78)
Bibliography

Grunthaner, P. J., Grunthaner, F. J., Fathauer, R. W., Lin, T. L., Hecht, M. H., Bell, L. D., Kaiser, W. J., Schowengerdt, F. D., & Mazur, J. H. (1989). Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy. Thin Solid Films, 183(1–2), 197–212.

Authors 9
  1. P.J. Grunthaner (first)
  2. F.J. Grunthaner (additional)
  3. R.W. Fathauer (additional)
  4. T.L. Lin (additional)
  5. M.H. Hecht (additional)
  6. L.D. Bell (additional)
  7. W.J. Kaiser (additional)
  8. F.D. Schowengerdt (additional)
  9. J.H. Mazur (additional)
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Dates
Type When
Created 22 years, 10 months ago (Oct. 18, 2002, 4:06 p.m.)
Deposited 6 years, 4 months ago (April 5, 2019, 4:21 a.m.)
Indexed 1 year, 6 months ago (Feb. 4, 2024, 9:43 a.m.)
Issued 35 years, 8 months ago (Dec. 1, 1989)
Published 35 years, 8 months ago (Dec. 1, 1989)
Published Print 35 years, 8 months ago (Dec. 1, 1989)
Funders 0

None

@article{Grunthaner_1989, title={Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy}, volume={183}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/0040-6090(89)90445-8}, DOI={10.1016/0040-6090(89)90445-8}, number={1–2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Grunthaner, P.J. and Grunthaner, F.J. and Fathauer, R.W. and Lin, T.L. and Hecht, M.H. and Bell, L.D. and Kaiser, W.J. and Schowengerdt, F.D. and Mazur, J.H.}, year={1989}, month=dec, pages={197–212} }