DOI: 10.1016/0040-6090(80)90038-3. Mechanisms of reactive sputtering of indium II: Growth of indium oxynitride in mixed N2-O2 discharges

Mechanisms of reactive sputtering of indium II: Growth of indium oxynitride in mixed N2-O2 discharges

10.1016/0040-6090(80)90038-3

Crossref journal-article

Elsevier BV

Thin Solid Films (78)

Bibliography

Natarajan, B. R., Eltoukhy, A. H., Greene, J. E., & Barr, T. L. (1980). Mechanisms of reactive sputtering of indium II: Growth of indium oxynitride in mixed N2-O2 discharges. Thin Solid Films, 69(2), 217â227.

Authors 4

B.R. Natarajan (first)
A.H. Eltoukhy (additional)
J.E. Greene (additional)
T.L. Barr (additional)

References 16 Referenced 37

10.1016/0040-6090(80)90037-1 / Thin Solid Films by Natarajan (1980)
{'key': '10.1016/0040-6090(80)90038-3_BIB2', 'series-title': 'Metallurgical Thermochemistry', 'author': 'Kubashewski', 'year': '1967'} / Metallurgical Thermochemistry by Kubashewski (1967)
{'key': '10.1016/0040-6090(80)90038-3_BIB3', 'volume': 'Vol. 9', 'author': 'Vossen', 'year': '1976'} by Vossen (1976)
10.1002/pssa.2210470139 / Phys. Status Solidi A by Wickersham (1978)
10.1116/1.1318510 / J. Vac. Sci. Technol. by Greene (1973)
10.1116/1.1492586 / J. Vac. Sci. Technol. by Jones (1967)
10.1007/BF00549739 / J. Mater. Sci. by Holland (1968)
10.1016/0040-6090(73)90125-9 / Thin Solid Films by Heller (1973)
10.1016/0040-6090(75)90300-4 / Thin Solid Films by Abe (1975)
10.1016/0040-6090(76)90006-7 / Thin Solid Films by Donaghey (1976)
10.1016/0368-2048(77)85011-1 / J. Electron Spectrosc. Relat. Phenom. by Honda (1977)
10.1016/0040-6090(80)90039-5 / Thin Solid Films by Eltoukhy (1980)
10.1016/0040-6090(76)90078-X / Thin Solid Films by Gorencheu (1976)
10.1103/PhysRev.128.174 / Phys. Rev. by Schulz (1962)
10.1103/PhysRev.135.A988 / Phys. Rev. A by Schulz (1964)
10.7567/JJAPS.2S1.501 / Jpn. J. Appl. Phys. by Coburn (1974)

Dates

Type	When
Created	22 years, 10 months ago (Oct. 18, 2002, 12:52 p.m.)
Deposited	6 years, 5 months ago (April 4, 2019, 11:21 p.m.)
Indexed	2 days, 18 hours ago (Sept. 3, 2025, 6:23 a.m.)
Issued	45 years, 3 months ago (June 1, 1980)
Published	45 years, 3 months ago (June 1, 1980)
Published Print	45 years, 3 months ago (June 1, 1980)

Funders 0

None

BibTeX

@article{Natarajan_1980, title={Mechanisms of reactive sputtering of indium II: Growth of indium oxynitride in mixed N2-O2 discharges}, volume={69}, ISSN={0040-6090}, url={http://dx.doi.org/10.1016/0040-6090(80)90038-3}, DOI={10.1016/0040-6090(80)90038-3}, number={2}, journal={Thin Solid Films}, publisher={Elsevier BV}, author={Natarajan, B.R. and Eltoukhy, A.H. and Greene, J.E. and Barr, T.L.}, year={1980}, month=jun, pages={217–227} }

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