DOI: 10.1016/0039-6028(95)90033-0. Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence

10.1016/0039-6028(95)90033-0

Crossref journal-article

Elsevier BV

Surface Science (78)

Bibliography

Dillon, A. C., Ott, A. W., Way, J. D., & George, S. M. (1995). Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence. Surface Science, 322(1â3), 230â242.

Authors 4

A.C. Dillon (first)
A.W. Ott (additional)
J.D. Way (additional)
S.M. George (additional)

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Dates

Type	When
Created	22 years, 10 months ago (Oct. 11, 2002, 3:37 a.m.)
Deposited	6 years, 4 months ago (April 11, 2019, 1:51 a.m.)
Indexed	1 month ago (July 20, 2025, 12:07 a.m.)
Issued	30 years, 7 months ago (Jan. 1, 1995)
Published	30 years, 7 months ago (Jan. 1, 1995)
Published Print	30 years, 7 months ago (Jan. 1, 1995)

Funders 0

None

BibTeX

@article{Dillon_1995, title={Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence}, volume={322}, ISSN={0039-6028}, url={http://dx.doi.org/10.1016/0039-6028(95)90033-0}, DOI={10.1016/0039-6028(95)90033-0}, number={1–3}, journal={Surface Science}, publisher={Elsevier BV}, author={Dillon, A.C. and Ott, A.W. and Way, J.D. and George, S.M.}, year={1995}, month=jan, pages={230–242} }

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