Crossref journal-article
Elsevier BV
Surface Science (78)
Bibliography

Terminello, L. J., Yarmoff, J. A., d’Heurle, F. M., & McFeely, F. R. (1991). Pressure dependence of oxide growth rate on silicon and metal silicides. Surface Science, 243(1–3), 127–131.

Authors 4
  1. L.J Terminello (first)
  2. J.A Yarmoff (additional)
  3. F.M d'Heurle (additional)
  4. F.R McFeely (additional)
References 11 Referenced 4
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  2. 10.1016/0040-6090(86)90166-5 / Thin Solid Films by Jiang (1986)
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  4. 10.1063/1.339383 / J. Appl. Phys. by Frampton (1987)
  5. 10.1116/1.583112 / J. Vac. Sci. Techol. by Kuiper (1985)
  6. {'first-page': '35', 'year': '1988', 'author': 'Raider', 'key': '10.1016/0039-6028(91)90351-R_BIB6'} by Raider (1988)
  7. 10.1063/1.100105 / Appl. Phys. Lett. by Walkup (1988)
  8. 10.1103/PhysRevB.38.6084 / Phys. Rev. by Himpsel (1988)
  9. 10.1103/PhysRevLett.55.2332 / Phys. Rev. Lett. by Tromp (1985)
  10. 10.1016/0029-554X(80)90655-2 / Nucl. Instrum. Methods by Eastman (1980)
  11. 10.1016/0167-5087(84)90513-1 / Nucl. Instrum. Methods by Himpsel (1984)
Dates
Type When
Created 22 years, 10 months ago (Oct. 18, 2002, 5:45 a.m.)
Deposited 6 years, 4 months ago (April 5, 2019, 9:23 a.m.)
Indexed 11 months, 1 week ago (Sept. 15, 2024, 9:27 p.m.)
Issued 34 years, 6 months ago (Feb. 1, 1991)
Published 34 years, 6 months ago (Feb. 1, 1991)
Published Print 34 years, 6 months ago (Feb. 1, 1991)
Funders 0

None

@article{Terminello_1991, title={Pressure dependence of oxide growth rate on silicon and metal silicides}, volume={243}, ISSN={0039-6028}, url={http://dx.doi.org/10.1016/0039-6028(91)90351-r}, DOI={10.1016/0039-6028(91)90351-r}, number={1–3}, journal={Surface Science}, publisher={Elsevier BV}, author={Terminello, L.J and Yarmoff, J.A and d’Heurle, F.M and McFeely, F.R}, year={1991}, month=feb, pages={127–131} }