DOI: 10.1016/0039-6028(76)90111-4. Hot electrons in Si inversion layer

Hot electrons in Si inversion layer

10.1016/0039-6028(76)90111-4

Crossref journal-article

Elsevier BV

Surface Science (78)

Bibliography

Nakamura, K. (1976). Hot electrons in Si inversion layer. Surface Science, 58(1), 48â55.

Authors 1

Koichi Nakamura (first)

References 9 Referenced 19

10.1063/1.1663398 / J. Appl. Phys. by Hess (1974)
10.1103/PhysRevB.10.3375 / Phys. Rev. by Hess (1974)
10.1016/0039-6028(74)90249-0 / Surface Sci. by Krowne (1974)
10.1016/0039-6028(74)90250-7 / Surface Sci. by Krowne (1974)
10.1143/JJAP.13.126 / Japan. J. Appl. Phys. by Ezawa (1974)
S. Kawaji, private communication.
10.1016/0003-4916(71)90149-7 / Ann. Phys. (NY) by Ezawa (1971)
10.1103/PhysRevB.5.4891 / Phys. Rev. by Stern (1972)
10.1103/PhysRev.120.2024 / Phys. Rev. by Long (1960)

Dates

Type	When
Created	22 years, 10 months ago (Oct. 18, 2002, 7:23 a.m.)
Deposited	6 years, 4 months ago (April 5, 2019, 6:20 a.m.)
Indexed	1 year, 6 months ago (Feb. 4, 2024, 8:42 p.m.)
Issued	49 years ago (Aug. 1, 1976)
Published	49 years ago (Aug. 1, 1976)
Published Print	49 years ago (Aug. 1, 1976)

Funders 0

None

BibTeX

@article{Nakamura_1976, title={Hot electrons in Si inversion layer}, volume={58}, ISSN={0039-6028}, url={http://dx.doi.org/10.1016/0039-6028(76)90111-4}, DOI={10.1016/0039-6028(76)90111-4}, number={1}, journal={Surface Science}, publisher={Elsevier BV}, author={Nakamura, Koichi}, year={1976}, month=aug, pages={48–55} }

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