Improved Diffusion-Resistant Ability of Multicomponent Nitrides: From Unitary TiN to Senary High-Entropy (TiTaCrZrAlRu)N
10.1007/s11837-013-0676-2
Crossref journal-article
Springer Science and Business Media LLC
JOM (297)
Bibliography

Chang, S.-Y., Huang, Y.-C., Li, C.-E., Hsu, H.-F., Yeh, J.-W., & Lin, S.-J. (2013). Improved Diffusion-Resistant Ability of Multicomponent Nitrides: From Unitary TiN to Senary High-Entropy (TiTaCrZrAlRu)N. JOM, 65(12), 1790–1796.

Authors 6
  1. Shou-Yi Chang (first)
  2. Yi-Ching Huang (additional)
  3. Chen-En Li (additional)
  4. Hsun-Feng Hsu (additional)
  5. Jien-Wei Yeh (additional)
  6. Su-Jien Lin (additional)
References 37 Referenced 27
  1. J.W. Yeh, S.K. Chen, S.J. Lin, J.Y. Gan, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang, Adv. Eng. Mater. 6, 299 (2004). (10.1002/adem.200300567) / Adv. Eng. Mater. by JW Yeh (2004)
  2. J.W. Yeh, S.K. Chen, J.Y. Gan, S.J. Lin, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang, Metall. Mater. Trans. A 35A, 2533 (2004). (10.1007/s11661-006-0234-4) / Metall. Mater. Trans. A by JW Yeh (2004)
  3. C.J. Tong, Y.L. Chen, S.K. Chen, J.W. Yeh, T.T. Shun, C.H. Tsau, S.J. Lin, and S.Y. Chang, Metall. Mater. Trans. A 36A, 881 (2005). (10.1007/s11661-005-0283-0) / Metall. Mater. Trans. A by CJ Tong (2005)
  4. J.W. Yeh, S.Y. Chang, Y.D. Hong, S.K. Chen, and S.J. Lin, Mater. Chem. Phys. 103, 41 (2007). (10.1016/j.matchemphys.2007.01.003) / Mater. Chem. Phys. by JW Yeh (2007)
  5. C.J. Tong, M.R. Chen, S.K. Chen, J.W. Yeh, T.T. Shun, S.J. Lin, and S.Y. Chang, Metall. Mater. Trans. A 36A, 1263 (2005). (10.1007/s11661-005-0218-9) / Metall. Mater. Trans. A by CJ Tong (2005)
  6. C.H. Lai, S.J. Lin, J.W. Yeh, and S.Y. Chang, Surf. Coat. Technol. 201, 3275 (2006). (10.1016/j.surfcoat.2006.06.048) / Surf. Coat. Technol. by CH Lai (2006)
  7. S.Y. Chang, S.Y. Lin, Y.C. Huang, and C.L. Wu, Surf. Coat. Technol. 204, 3307 (2010). (10.1016/j.surfcoat.2010.03.041) / Surf. Coat. Technol. by SY Chang (2010)
  8. S.Y. Chang, S.Y. Lin, and Y.C. Huang, Thin Solid Films 519, 4865 (2011). (10.1016/j.tsf.2011.01.043) / Thin Solid Films by SY Chang (2011)
  9. S.Y. Lin, S.Y. Chang, Y.C. Huang, F.S. Shieu, and J.W. Yeh, Surf. Coat. Technol. 206, 5096 (2012). (10.1016/j.surfcoat.2012.06.035) / Surf. Coat. Technol. by SY Lin (2012)
  10. S.Y. Chang, M.K. Chen, and D.S. Chen, J. Electrochem. Soc. 156, G37 (2009). (10.1149/1.3097186) / J. Electrochem. Soc. by SY Chang (2009)
  11. S.Y. Chang and D.S. Chen, Appl. Phys. Lett. 94, 231909 (2009). (10.1063/1.3155196) / Appl. Phys. Lett. by SY Chang (2009)
  12. S.Y. Chang and D.S. Chen, J. Electrochem. Soc. 157, G154 (2010). (10.1149/1.3374194) / J. Electrochem. Soc. by SY Chang (2010)
  13. S.Y. Chang, C.Y. Wang, M.K. Chen, and C.E. Li, J. Alloy Compd. 509, L85 (2011). (10.1016/j.jallcom.2010.11.124) / J. Alloy Compd. by SY Chang (2011)
  14. S.Y. Chang, C.E. Li, S.C. Chiang, and Y.C. Huang, J. Alloy Compd. 515, 4 (2012). (10.1016/j.jallcom.2011.11.082) / J. Alloy Compd. by SY Chang (2012)
  15. A.E. Kaloyeros and E. Eisenbraun, Annu. Rev. Mater. Sci. 30, 363 (2000). (10.1146/annurev.matsci.30.1.363) / Annu. Rev. Mater. Sci. by AE Kaloyeros (2000)
  16. T. Kouno, H. Niwa, and M. Yamada, J. Electrochem. Soc. 145, 2164 (1998). (10.1149/1.1838612) / J. Electrochem. Soc. by T Kouno (1998)
  17. K.H. Min, K.C. Chun, and K.B. Kim, J. Vac. Sci. Technol. B 14, 3263 (1996). (10.1116/1.588818) / J. Vac. Sci. Technol. B by KH Min (1996)
  18. P. Alén, M. Ritala, K. Arstila, J. Keinonen, and M. Leskelä, J. Electrochem. Soc. 152, G361 (2005). (10.1149/1.1882012) / J. Electrochem. Soc. by P Alén (2005)
  19. S.H. Kwon, O.K. Kwon, J.S. Min, and S.W. Kang, J. Electrochem. Soc. 153, G578 (2006). (10.1149/1.2193335) / J. Electrochem. Soc. by SH Kwon (2006)
  20. C.W. Chen, J.S. Chen, and J.S. Jeng, J. Electrochem. Soc. 155, H438 (2008). (10.1149/1.2905749) / J. Electrochem. Soc. by CW Chen (2008)
  21. J.S. Fang, C.F. Chiu, J.H. Lin, T.Y. Lin, and T.S. Chin, J. Electrochem. Soc. 156, H147 (2009). (10.1149/1.3043440) / J. Electrochem. Soc. by JS Fang (2009)
  22. J.S. Fang, J.H. Lin, B.Y. Chen, and T.S. Chin, J. Electrochem. Soc. 158, H97 (2011). (10.1149/1.3518411) / J. Electrochem. Soc. by JS Fang (2011)
  23. P. Majumdera and C. Takoudis, Nanotechnology 19, 205202 (2008). (10.1088/0957-4484/19/20/205202) / Nanotechnology by P Majumdera (2008)
  24. L.C. Leu, D.P. Norton, L. McElwee, and T.J. Anderson, Appl. Phys. Lett. 92, 111917 (2008). (10.1063/1.2901035) / Appl. Phys. Lett. by LC Leu (2008)
  25. Q. Xie, Y.L. Jiang, J. Musschoot, D. Deduytsche, C. Detavernier, R.L. Van Meirhaeghe, S. Van Den Berghe, G.P. Ru, B.Z. Li, and X.P. Qu, Thin Solid Films 517, 4689 (2009). (10.1016/j.tsf.2009.03.001) / Thin Solid Films by Q Xie (2009)
  26. S.H. Kim, H.T. Kim, S.S. Yim, D.J. Lee, K.S. Kim, H.M. Kim, K.B. Kim, and H. Sohn, J. Electrochem. Soc. 155, H589 (2008). (10.1149/1.2940447) / J. Electrochem. Soc. by SH Kim (2008)
  27. Y. Wang, F. Cao, M.L. Zhang, and T. Zhang, Acta Mater. 59, 400 (2011). (10.1016/j.actamat.2010.09.053) / Acta Mater. by Y Wang (2011)
  28. P. Shewmon, Diffusion in Solids (The Minerals, Metals & Materials Society: Warrendale, PA, 2000). / Diffusion in Solids by P Shewmon (2000)
  29. L. Tsetsersis, S. Logothetidis, and S.T. Pantelides, Appl. Phys. Lett. 94, 161903 (2009). (10.1063/1.3122344) / Appl. Phys. Lett. by L Tsetsersis (2009)
  30. L. Tsetsersis, S. Logothetidis, and S.T. Pantelides, Surf. Coat. Technol. 204, 2089 (2010). (10.1016/j.surfcoat.2009.09.002) / Surf. Coat. Technol. by L Tsetsersis (2010)
  31. Y. Zhao and G. Lu, Phys. Rev. B. 79, 214101 (2009). (10.1103/PhysRevB.79.214101) / Phys. Rev. B. by Y Zhao (2009)
  32. M.Y. Kwak, D.H. Shin, T.W. Kang, and K.N. Kim, Thin Solid Films 339, 290 (1999). (10.1016/S0040-6090(98)01074-8) / Thin Solid Films by MY Kwak (1999)
  33. M.T. Wang, Y.C. Lin, and M.C. Chen, J. Electrochem. Soc. 145, 2538 (1998). (10.1149/1.1838675) / J. Electrochem. Soc. by MT Wang (1998)
  34. J.C. Chuang, S.L. Tu, and M.C. Chen, J. Electrochem. Soc. 145, 4290 (1998). (10.1149/1.1838953) / J. Electrochem. Soc. by JC Chuang (1998)
  35. M.B. Takeyama, A. Noya, and K. Sakanishi, J. Vac. Sci. Technol. B 18, 1333 (2000). (10.1116/1.591382) / J. Vac. Sci. Technol. B by MB Takeyama (2000)
  36. K.T. Nam, A. Datta, S.H. Kim, and K.B. Kim, Appl. Phys. Lett. 79, 2549 (2001). (10.1063/1.1409594) / Appl. Phys. Lett. by KT Nam (2001)
  37. T.N. Arunagiri, Y. Zhang, O. Chyan, M. El-Bouanani, M.J. Kim, K.H. Chen, C.T. Wu, and L.C. Chen, Appl. Phys. Lett. 86, 083104 (2005). (10.1063/1.1867560) / Appl. Phys. Lett. by TN Arunagiri (2005)
Dates
Type When
Created 12 years, 1 month ago (July 10, 2013, 4:20 p.m.)
Deposited 6 years, 2 months ago (June 1, 2019, 7:05 p.m.)
Indexed 1 year, 2 months ago (June 24, 2024, 12:36 p.m.)
Issued 12 years, 1 month ago (July 11, 2013)
Published 12 years, 1 month ago (July 11, 2013)
Published Online 12 years, 1 month ago (July 11, 2013)
Published Print 11 years, 8 months ago (Dec. 1, 2013)
Funders 0

None

@article{Chang_2013, title={Improved Diffusion-Resistant Ability of Multicomponent Nitrides: From Unitary TiN to Senary High-Entropy (TiTaCrZrAlRu)N}, volume={65}, ISSN={1543-1851}, url={http://dx.doi.org/10.1007/s11837-013-0676-2}, DOI={10.1007/s11837-013-0676-2}, number={12}, journal={JOM}, publisher={Springer Science and Business Media LLC}, author={Chang, Shou-Yi and Huang, Yi-Ching and Li, Chen-En and Hsu, Hsun-Feng and Yeh, Jien-Wei and Lin, Su-Jien}, year={2013}, month=jul, pages={1790–1796} }