DOI: 10.1007/s11664-002-0197-1. Low-resistance Ti/Al ohmic contact on undoped ZnO

Low-resistance Ti/Al ohmic contact on undoped ZnO

10.1007/s11664-002-0197-1

Crossref journal-article

Springer Science and Business Media LLC

Journal of Electronic Materials (297)

Bibliography

Young Kim, S., Won Jang, H., Kyu Kim, J., Min Jeon, C., Il Park, W., Yi, G.-C., & Lee, J.-L. (2002). Low-resistance Ti/Al ohmic contact on undoped ZnO. Journal of Electronic Materials, 31(8), 868â871.

Authors 7

Soo Young Kim (first)
Ho Won Jang (additional)
Jong Kyu Kim (additional)
Chang Min Jeon (additional)
Won Il Park (additional)
Gyu-Chul Yi (additional)
Jong-Lam Lee (additional)

References 12 Referenced 43

F.H. Nicoll, Appl. Phys. Lett. 9, 13 (1966). (10.1063/1.1754578) / Appl. Phys. Lett. by F.H. Nicoll (1966)
S.W. Koch, H. Haug, G. Schmieder, W. Bohnert, and C. Klingshirn, Phys. Status Solidi B 89, 431 (1978). (10.1002/pssb.2220890212) / Phys. Status Solidi B by S.W. Koch (1978)
F. Hamdani et al., Appl. Phys. Lett. 70, 467 (1997). (10.1063/1.118183) / Appl. Phys. Lett. by F. Hamdani (1997)
Z.K. Tang, G.K.L. Wong, and P. Yu, Appl. Phys. Lett. 72, 3270 (1998). (10.1063/1.121620) / Appl. Phys. Lett. by Z.K. Tang (1998)
D.M. Bagnall, Y.F. Chen, Z. Zhu, and T. Yao, Appl. Phys. Lett. 73, 1038 (1998). (10.1063/1.122077) / Appl. Phys. Lett. by D.M. Bagnall (1998)
T. Akane, K. Sugioka, and K. Midorikawa, J. Vac. Sci. Technol. B 18, 1406 (2000). (10.1116/1.591479) / J. Vac. Sci. Technol. B by T. Akane (2000)
H.K. Kim, S.-H. Han, W.-K. Choi, and T.Y. Seong, Appl. Phys. Lett. 77, 1647 (2000). (10.1063/1.1308527) / Appl. Phys. Lett. by H.K. Kim (2000)
I. Barin, F. Sauert, E.S. Rhonhof, and W.S. Sheng, Thermochemical Data of Pure Substances (New York: VCH, 1989). / Thermochemical Data of Pure Substances by I. Barin (1989)
A. Poppl and G. Volkel, Phys. Status Solidi (a) 125, 571 (1991). (10.1002/pssa.2211250218) / Phys. Status Solidi (a) by A. Poppl (1991)
G.D. Mahan, J. Appl. Phys. 54, 3825 (1983). (10.1063/1.332607) / J. Appl. Phys. by G.D. Mahan (1983)
S. Ruvimov, Z. Kiliental-Weber, J. Washburn, K.J. Duxstad, E.E. Haller, Z.-F. Fan, S.N. Mohammad, W. Kim, A.E. Botchkarev, and H. Morkoc, Appl. Phys. Lett. 69, 1556 (1996). (10.1063/1.117060) / Appl. Phys. Lett. by S. Ruvimov (1996)
J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben, Handbook of X-ray Photoelectron Spectroscopy (Eden Prairie, MN: Perkin-Elmer Corp., 1992). / Handbook of X-ray Photoelectron Spectroscopy by J.F. Moulder (1992)

Dates

Type	When
Created	18 years, 4 months ago (April 6, 2007, 2:42 p.m.)
Deposited	6 years, 2 months ago (June 1, 2019, 11:44 a.m.)
Indexed	1 year, 6 months ago (Feb. 4, 2024, 12:31 a.m.)
Issued	23 years ago (Aug. 1, 2002)
Published	23 years ago (Aug. 1, 2002)
Published Print	23 years ago (Aug. 1, 2002)

Funders 0

None

BibTeX

@article{Young_Kim_2002, title={Low-resistance Ti/Al ohmic contact on undoped ZnO}, volume={31}, ISSN={1543-186X}, url={http://dx.doi.org/10.1007/s11664-002-0197-1}, DOI={10.1007/s11664-002-0197-1}, number={8}, journal={Journal of Electronic Materials}, publisher={Springer Science and Business Media LLC}, author={Young Kim, Soo and Won Jang, Ho and Kyu Kim, Jong and Min Jeon, Chang and Il Park, Won and Yi, Gyu-Chul and Lee, Jong-Lam}, year={2002}, month=aug, pages={868–871} }

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