DOI: 10.1007/s005420050121. Photoresist application for the LIGA process

Photoresist application for the LIGA process

10.1007/s005420050121

Crossref journal-article

Springer Science and Business Media LLC

Microsystem Technologies (297)

Bibliography

Chaudhuri, B., Guckel, H., Klein, J., & Fischer, K. (1998). Photoresist application for the LIGA process. Microsystem Technologies, 4(4), 159â162.

Authors 4

B. Chaudhuri (first)
H. Guckel (additional)
J. Klein (additional)
K. Fischer (additional)

References 0 Referenced 7

None

Dates

Type	When
Created	23 years ago (Aug. 25, 2002, 1:09 a.m.)
Deposited	6 years, 3 months ago (May 29, 2019, 5:48 a.m.)
Indexed	4 months, 3 weeks ago (April 15, 2025, 2:10 a.m.)
Issued	27 years, 1 month ago (July 23, 1998)
Published	27 years, 1 month ago (July 23, 1998)
Published Print	27 years, 1 month ago (July 23, 1998)

Funders 0

None

BibTeX

@article{Chaudhuri_1998, title={Photoresist application for the LIGA process}, volume={4}, ISSN={1432-1858}, url={http://dx.doi.org/10.1007/s005420050121}, DOI={10.1007/s005420050121}, number={4}, journal={Microsystem Technologies}, publisher={Springer Science and Business Media LLC}, author={Chaudhuri, B. and Guckel, H. and Klein, J. and Fischer, K.}, year={1998}, month=jul, pages={159–162} }

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