DOI: 10.1007/s003400050627. Third and fourth harmonic generation at Si-SiO 2 interfaces and in Si-SiO 2 -Cr MOS structures

Third and fourth harmonic generation at Si-SiO 2 interfaces and in Si-SiO 2 -Cr MOS structures

10.1007/s003400050627

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics B: Lasers and Optics (297)

Bibliography

Kempf, R. W., Wilson, P. T., Canterbury, J. D., Mishina, E. D., Aktsipetrov, O. A., & Downer, M. C. (1999). Third and fourth harmonic generation at Si-SiO 2 interfaces and in Si-SiO 2 -Cr MOS structures. Applied Physics B: Lasers and Optics, 68(3), 325â332.

Authors 6

R.W. Kempf (first)
P.T. Wilson (additional)
J.D. Canterbury (additional)
E.D. Mishina (additional)
O.A. Aktsipetrov (additional)
M.C. Downer (additional)

References 0 Referenced 13

None

Dates

Type	When
Created	23 years ago (Aug. 25, 2002, 4:19 a.m.)
Deposited	6 years, 3 months ago (May 28, 2019, 9:30 a.m.)
Indexed	4 months, 2 weeks ago (April 17, 2025, 12:11 a.m.)
Issued	26 years, 6 months ago (March 1, 1999)
Published	26 years, 6 months ago (March 1, 1999)
Published Print	26 years, 6 months ago (March 1, 1999)

Funders 0

None

BibTeX

@article{Kempf_1999, title={Third and fourth harmonic generation at Si-SiO 2 interfaces and in Si-SiO 2 -Cr MOS structures}, volume={68}, ISSN={1432-0649}, url={http://dx.doi.org/10.1007/s003400050627}, DOI={10.1007/s003400050627}, number={3}, journal={Applied Physics B: Lasers and Optics}, publisher={Springer Science and Business Media LLC}, author={Kempf, R.W. and Wilson, P.T. and Canterbury, J.D. and Mishina, E.D. and Aktsipetrov, O.A. and Downer, M.C.}, year={1999}, month=mar, pages={325–332} }

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