DOI: 10.1007/s003400050290. Nanoscale atomic lithography with a cesium atomic beam

Nanoscale atomic lithography with a cesium atomic beam

10.1007/s003400050290

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics B: Lasers and Optics (297)

Bibliography

Lison, F., Adams, H.-J., Haubrich, D., Kreis, M., Nowak, S., & Meschede, D. (1997). Nanoscale atomic lithography with a cesium atomic beam. Applied Physics B: Lasers and Optics, 65(3), 419â421.

Authors 6

F. Lison (first)
H.-J. Adams (additional)
D. Haubrich (additional)
M. Kreis (additional)
S. Nowak (additional)
D. Meschede (additional)

References 0 Referenced 48

None

Dates

Type	When
Created	23 years ago (Aug. 25, 2002, 12:19 a.m.)
Deposited	6 years, 3 months ago (May 28, 2019, 11:24 a.m.)
Indexed	1 year, 7 months ago (Feb. 4, 2024, 12:23 a.m.)
Issued	28 years ago (Sept. 1, 1997)
Published	28 years ago (Sept. 1, 1997)
Published Print	28 years ago (Sept. 1, 1997)

Funders 0

None

BibTeX

@article{Lison_1997, title={Nanoscale atomic lithography with a cesium atomic beam}, volume={65}, ISSN={1432-0649}, url={http://dx.doi.org/10.1007/s003400050290}, DOI={10.1007/s003400050290}, number={3}, journal={Applied Physics B: Lasers and Optics}, publisher={Springer Science and Business Media LLC}, author={Lison, F. and Adams, H.-J. and Haubrich, D. and Kreis, M. and Nowak, S. and Meschede, D.}, year={1997}, month=sep, pages={419–421} }

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