DOI: 10.1007/s00339-004-3166-0. Plasma-produced ultra-thin platinum-oxide films for nanoelectronics: physical characterization

Plasma-produced ultra-thin platinum-oxide films for nanoelectronics: physical characterization

10.1007/s00339-004-3166-0

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics A (297)

Bibliography

Blackstock, J. J., Stewart, D. R., & Li, Z. (2005). Plasma-produced ultra-thin platinum-oxide films for nanoelectronics: physical characterization. Applied Physics A, 80(6), 1343â1353.

Authors 3

J.J. Blackstock (first)
D.R. Stewart (additional)
Z. Li (additional)

References 24 Referenced 41

C.R. Aita: J. Appl. Phys. 58, 3169 (1985) (10.1063/1.335823) / J. Appl. Phys. by Aita (1985)
J.R. McBride, G.W. Graham, C.R. Peters, W.H. Weber: J. Appl. Phys. 69, 1596 (1991) (10.1063/1.347255) / J. Appl. Phys. by McBride (1991)
H. Neff, S. Henkel, E. Hartmannsgruber, E. Steinbeiss, W. Michalke, K. Steenbeck, H.G. Schmidt: J. Appl. Phys. 79, 7672 (1996) (10.1063/1.362341) / J. Appl. Phys. by Neff (1996)
Y. Abe, H. Yanagisawa, K. Sasaki: Jpn. J. Appl. Phys. 37, 4482 (1998) (10.1143/JJAP.37.4482) / Jpn. J. Appl. Phys. by Abe (1998)
L. Maya, L. Riester, T. Thundat, C.S. Yust: J. Appl. Phys. 84, 6382 (1998) (10.1063/1.368883) / J. Appl. Phys. by Maya (1998)
Y. Abe, M. Kawamura, K. Sasaki: Jpn. J. Appl. Phys. 38, 2092 (1999) (10.1143/JJAP.38.2092) / Jpn. J. Appl. Phys. by Abe (1999)
J.J. Hickman, P.E. Laibinis, D.I. Auerbach, C. Zou, T.J. Gardner, G.M. Whitesides, M.S. Wrighton: Langmuir 8, 357 (1992) (10.1021/la00038a005) / Langmuir by Hickman (1992)
M. Hecq, A. Hecq, J.P. Delrue, T. Robert: J. Less-Common Met. 64, 25 (1979) (10.1016/0022-5088(79)90185-1) / J. Less-Common Met. by Hecq (1979)
S.C. Street, C. Xu, D.W. Goodman: Annu. Rev. Phys. Chem. 48, 43 (1997) (10.1146/annurev.physchem.48.1.43) / Annu. Rev. Phys. Chem. by Street (1997)
Z. Li, P. Beck, D.A.A. Ohlberg, D.R. Stewart, R.S. Williams: Surf. Sci. 529, 410 (2003) (10.1016/S0039-6028(03)00015-3) / Surf. Sci. by Li (2003)
Y. Chen, G.Y. Jung, D.A.A. Ohlberg, X. Li, D.R. Stewart, J.O. Jeppesen, K.A. Nielsen, J.F. Stoddart, R.S. Williams: Nanotechnology 14, 462 (2003) (10.1088/0957-4484/14/4/311) / Nanotechnology by Chen (2003)
Y. Chen, D.A.A. Ohlberg, X.M. Li, D.R. Stewart, R.S. Williams, J.O. Jeppesen, K.A. Nielsen, J.F. Stoddart, D.L. Olynick, E. Anderson: Appl. Phys. Lett. 82, 1610 (2003) (10.1063/1.1559439) / Appl. Phys. Lett. by Chen (2003)
N.A. Melosh, A. Boukai, F. Diana, B. Gerardot, A. Badolato, P.M. Petroff, H.R. Heath: Science 300, 112 (2003) (10.1126/science.1081940) / Science by Melosh (2003)
D. Al-Mawlawi, C.Z. Liu, M. Moskovits: J. Mater. Res. 9, 1014 (1994) (10.1557/JMR.1994.1014) / J. Mater. Res. by Al-Mawlawi (1994)
D.R. Stewart, D.A.A. Ohlberg, P.A. Beck, C.N. Lau, R.S. Williams: Appl. Phys. A, DOI: 10.1007/s00339-004-3173-1 (2005) (10.1007/s00339-004-3173-1)
X.G. Zhang, W.H. Butler: Phys. Rev. B 51, 10085 (1995) (10.1103/PhysRevB.51.10085) / Phys. Rev. B by Zhang (1995)
S. Tanuma, C.J. Powell, D.R. Penn: Surf. Interface Anal. 21, 165 (1994) (10.1002/sia.740210302) / Surf. Interface Anal. by Tanuma (1994)
C.J. Powell, A. Jablonski: NIST Standard Reference Database 82: Electron Effective Attenuation Length Database, 1.0 edn., National Institute of Standards and Technology, Gaitherburg, MD, 2001
ARtick, 1.0 edn., National Physical Laboratory, UK National Standards Laboratory, 1999
NIST, XPS Database, Web edn., National Institute of Standards and Technology, Gaitherburg, MD, 2004
G.Y. Jung, Z. Li, W. Wu, W.M. Tong, Y. Chen, S.Y. Wang, R.S. Williams: (2004) in preparation
S.R. Wasserman, Y.T. Tao, G.M. Whitesides: Langmuir 5, 1074 (1989) (10.1021/la00088a035) / Langmuir by Wasserman (1989)
S.R. Wasserman, G.M. Whitesides, I.M. Tidswell, B.M. Ocko, P.S. Pershan, J.D. Axe: J. Am. Ceram. Soc. 111, 5852 (1989) / J. Am. Ceram. Soc. by Wasserman (1989)
A. Ulman: Introduction to Ultrathin Organic Films (Academic, San Diego, CA 1991)

Dates

Type	When
Created	20 years, 5 months ago (March 14, 2005, 1:06 p.m.)
Deposited	6 years, 2 months ago (May 28, 2019, 8:36 a.m.)
Indexed	2 months, 3 weeks ago (May 29, 2025, 7:50 a.m.)
Issued	20 years, 5 months ago (March 1, 2005)
Published	20 years, 5 months ago (March 1, 2005)
Published Online	20 years, 5 months ago (March 1, 2005)
Published Print	20 years, 5 months ago (March 1, 2005)

Funders 0

None

BibTeX

@article{Blackstock_2005, title={Plasma-produced ultra-thin platinum-oxide films for nanoelectronics: physical characterization}, volume={80}, ISSN={1432-0630}, url={http://dx.doi.org/10.1007/s00339-004-3166-0}, DOI={10.1007/s00339-004-3166-0}, number={6}, journal={Applied Physics A}, publisher={Springer Science and Business Media LLC}, author={Blackstock, J.J. and Stewart, D.R. and Li, Z.}, year={2005}, month=mar, pages={1343–1353} }

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