Abstract
AbstractA sample preparation method has been developed whereby sharp needle-shaped specimens for atom probe analysis are fabricated from multilayer thin films deposited onto silicon substrates. The specimens are fabricated in an orientation such that atom probe composition profiles across the layer interfaces can be determined with atomic-layer spatial resolution, i.e., the layer normals are parallel to the needle axis. The method uses standard silicon etching techniques and focused ion-beam milling. The feasibility and utility of this technique are shown through its application to a NiFe/CoFe/Cu/CoFe-based thin film structure.
Dates
Type | When |
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Created | 5 years, 2 months ago (June 22, 2020, 4:49 p.m.) |
Deposited | 2 years, 6 months ago (Feb. 14, 2023, 6:31 a.m.) |
Indexed | 1 month ago (July 23, 2025, 9:03 a.m.) |
Issued | 24 years, 7 months ago (Jan. 1, 2001) |
Published | 24 years, 7 months ago (Jan. 1, 2001) |
Published Online | 23 years, 6 months ago (Feb. 2, 2002) |
Published Print | 24 years, 7 months ago (Jan. 1, 2001) |
@article{Larson_2001, title={Advances in Atom Probe Specimen Fabrication from Planar Multilayer Thin Film Structures}, volume={7}, ISSN={1435-8115}, url={http://dx.doi.org/10.1007/s100050010058}, DOI={10.1007/s100050010058}, number={1}, journal={Microscopy and Microanalysis}, publisher={Oxford University Press (OUP)}, author={Larson, D.J. and Wissman, B.D. and Martens, R.L. and Viellieux, R.J. and Kelly, T.F. and Gribb, T.T. and Erskine, H.F. and Tabat, N.}, year={2001}, month=jan, pages={24–31} }