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journal-article
Springer Science and Business Media LLC
Journal of Electronic Materials (297)
References
17
Referenced
11
- There are many papers on this subject, several reviews are: J. H. van der Merwe and C. A. Ball (p. 491) and J. W. Matthews (p. 559), in “Epitaxial Growth,” ed. J. W. Matthews (Academic, NY, 1975); R. Hull and J. C. Bean, in “Semiconductors and Semimetals,” Vol. 33; E. A. Fitzgerald, submitted to Mat. Sci. Rep.
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B. W. Dodson, Appl. Phys. Lett.53, 37 (1988).
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Dates
Type | When |
---|---|
Created | 18 years, 1 month ago (July 16, 2007, 5:52 p.m.) |
Deposited | 6 years, 3 months ago (May 20, 2019, 9:36 p.m.) |
Indexed | 1 year, 7 months ago (Feb. 3, 2024, 2:08 p.m.) |
Issued | 34 years, 2 months ago (July 1, 1991) |
Published | 34 years, 2 months ago (July 1, 1991) |
Published Print | 34 years, 2 months ago (July 1, 1991) |
@article{Volkert_1991, title={Strain relaxation in Ge0.09Si0.91 epitaxial thin films measured by wafer curvature}, volume={20}, ISSN={1543-186X}, url={http://dx.doi.org/10.1007/bf02665972}, DOI={10.1007/bf02665972}, number={7}, journal={Journal of Electronic Materials}, publisher={Springer Science and Business Media LLC}, author={Volkert, C. A. and Fitzgerald, E. A. and Hull, R. and Xie, Y. H. and Mii, Y. J.}, year={1991}, month=jul, pages={833–837} }