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Huang, R., & Kitai, A. H. (1993). Preparation and characterization of thin films of MgO, Al2O3 and MgAl2O4 by atomic layer deposition. Journal of Electronic Materials, 22(2), 215–220.

Authors 2
  1. Ron Huang (first)
  2. Adrian H. Kitai (additional)
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Dates
Type When
Created 18 years, 1 month ago (July 16, 2007, 6:17 p.m.)
Deposited 3 years, 3 months ago (May 15, 2022, 2:17 p.m.)
Indexed 1 month ago (Aug. 3, 2025, 7:06 p.m.)
Issued 32 years, 7 months ago (Feb. 1, 1993)
Published 32 years, 7 months ago (Feb. 1, 1993)
Published Print 32 years, 7 months ago (Feb. 1, 1993)
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@article{Huang_1993, title={Preparation and characterization of thin films of MgO, Al2O3 and MgAl2O4 by atomic layer deposition}, volume={22}, ISSN={1543-186X}, url={http://dx.doi.org/10.1007/bf02665029}, DOI={10.1007/bf02665029}, number={2}, journal={Journal of Electronic Materials}, publisher={Springer Science and Business Media LLC}, author={Huang, Ron and Kitai, Adrian H.}, year={1993}, month=feb, pages={215–220} }