DOI: 10.1007/bf00903217. Mechanism and kinetics of the diffusion of gold in silicon

Mechanism and kinetics of the diffusion of gold in silicon

10.1007/bf00903217

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics (297)

Bibliography

GÃ¶sele, U., Frank, W., & Seeger, A. (1980). Mechanism and kinetics of the diffusion of gold in silicon. Applied Physics, 23(4), 361â368.

Authors 3

U. Gösele (first)
W. Frank (additional)
A. Seeger (additional)

References 31 Referenced 311

W. M. Bullis: Solid-State Electron.9, 143 (1966) (10.1016/0038-1101(66)90085-2) / Solid-State Electron. by W. M. Bullis (1966)
J. L. Lambert: Wiss. Ber. AEG-Telefunken45, 153 (1972) / Wiss. Ber. AEG-Telefunken by J. L. Lambert (1972)
W. C. Dash: J. Appl. Phys.31, 2275 (1960) (10.1063/1.1735538) / J. Appl. Phys. by W. C. Dash (1960)
W. R. Wilcox, T. J. LaChapelle: J. Appl. Phys.35, 240 (1964) (10.1063/1.1713077) / J. Appl. Phys. by W. R. Wilcox (1964)
F. A. Huntley, A. F. W. Willoughby: Solid-State Electron.13, 1231 (1970) (10.1016/0038-1101(70)90020-1) / Solid-State Electron. by F. A. Huntley (1970)
F. A. Huntley, A. F. W. Willoughby: J. Electrochem. Soc.120, 414 (1973) (10.1149/1.2403468) / J. Electrochem. Soc. by F. A. Huntley (1973)
F. A. Huntley, A. F. W. Willoughby: Philos. Mag.28, 1319 (1973) (10.1080/14786437308228002) / Philos. Mag. by F. A. Huntley (1973)
T. Iizuka: Jpn. J. Appl. Phys.4, 1018 (1966) (10.1143/JJAP.5.1018) / Jpn. J. Appl. Phys. by T. Iizuka (1966)
M. Yoshida, K. Saito: Jpn. J. Appl. Phys9, 1217 (1970) (10.1143/JJAP.9.1217) / Jpn. J. Appl. Phys by M. Yoshida (1970)
J. L. Lambert: Phys. Stat. Solidi A4, K33 (1971) (10.1002/pssa.2210040138) / Phys. Stat. Solidi A by J. L. Lambert (1971)
M. Schulz, A. Goetzberger, I. Fränz, W. Langheinrich: Appl. Phys.3, 275 (1974) (10.1007/BF00887275) / Appl. Phys. by M. Schulz (1974)
S. Kästner, J. Hesse: Phys. Stat. Solidi A25, 261 (1974) (10.1002/pssa.2210250124) / Phys. Stat. Solidi A by S. Kästner (1974)
E. Scheibe, W. Schröter: Inst. Phys. Conf. Ser.31, 272 (1977) / Inst. Phys. Conf. Ser. by E. Scheibe (1977)
F. C. Frank, D. Turnbull: Phys. Rev.104, 617 (1956) (10.1103/PhysRev.104.617) / Phys. Rev. by F. C. Frank (1956)
W. Frank, U. Gösele, A. Seeger: Inst. Phys. Conf. Ser.46, 514 (1979) / Inst. Phys. Conf. Ser. by W. Frank (1979)
M. D. Sturge: Proc. Phys. Soc. London73, 297 (1959) (10.1088/0370-1328/73/2/319) / Proc. Phys. Soc. London by M. D. Sturge (1959)
M. J. Hill, M. Lietz, R. Sittig, W. Frank, U. Gösele, A. Seeger: Proc. Intern. Conf. on Radiation Physics of Semiconductors and Related Materials (Tbilisi 1979), in press
M. J. Hill, M. Lietz, R. Sittig: J. Electrochem. Soc., to be submitted
G. J. Sprokel, J. M. Fairfield: J. Electrochem. Soc.112, 200 (1965) (10.1149/1.2423495) / J. Electrochem. Soc. by G. J. Sprokel (1965)
F. R. N. Nabarro:Theory of Crystal Dislocations (Clarendon Press, Oxford 1967) / Theory of Crystal Dislocations by F. R. N. Nabarro (1967)
J. Friedel, M. Yoshida: Philos. Mag.31, 229 (1975) (10.1080/14786437508229299) / Philos. Mag. by J. Friedel (1975)
A. Seeger, K. P. Chik: Phys. Stat. Solidi29, 455 (1968) (10.1002/pssb.19680290202) / Phys. Stat. Solidi by A. Seeger (1968)
A. Seeger: Radiat. Eff.9, 15 (1971) (10.1080/00337577108242025) / Radiat. Eff. by A. Seeger (1971)
W. Frank: Inst. Phys. Conf. Ser.23, 23 (1975) / Inst. Phys. Conf. Ser. by W. Frank (1975)
A. Seeger, H. Föll, W. Frank: Inst. Phys. Conf. Ser.31, 12 (1977) / Inst. Phys. Conf. Ser. by A. Seeger (1977)
H. Föll, U. Gösele, B. O. Kolbesen: J. Cryst. Growth40, 90 (1977) (10.1016/0022-0248(77)90034-3) / J. Cryst. Growth by H. Föll (1977)
A. Seeger, W. Frank, U. Gösele: Inst. Phys. Conf. Ser.46, 148 (1979) / Inst. Phys. Conf. Ser. by A. Seeger (1979)
U. Gösele, H. Strunk: Appl. Phys.20, 265 (1979) (10.1007/BF00894994) / Appl. Phys. by U. Gösele (1979)
W. Frank, U. Gösele, A. Seeger: Proc. Intern. Conf. on Radiation Physics of Semiconductors and Related Materials (Tbilisi 1979), in press
G. Bluman, S. Kumei: J. Math. Phys. N.Y.21, 1019 (1980) (10.1063/1.524550) / J. Math. Phys. N.Y. by G. Bluman (1980)
G. Hettich, H. Mehrer, K. Maier: Inst. Phys. Conf. Ser.46, 500 (1979) / Inst. Phys. Conf. Ser. by G. Hettich (1979)

Dates

Type	When
Created	20 years, 8 months ago (Jan. 1, 2005, 4:04 a.m.)
Deposited	6 years, 4 months ago (April 29, 2019, 12:18 p.m.)
Indexed	3 days, 8 hours ago (Sept. 3, 2025, 6:21 a.m.)
Issued	44 years, 9 months ago (Dec. 1, 1980)
Published	44 years, 9 months ago (Dec. 1, 1980)
Published Print	44 years, 9 months ago (Dec. 1, 1980)

Funders 0

None

BibTeX

@article{G_sele_1980, title={Mechanism and kinetics of the diffusion of gold in silicon}, volume={23}, ISSN={1432-0630}, url={http://dx.doi.org/10.1007/bf00903217}, DOI={10.1007/bf00903217}, number={4}, journal={Applied Physics}, publisher={Springer Science and Business Media LLC}, author={Gösele, U. and Frank, W. and Seeger, A.}, year={1980}, month=dec, pages={361–368} }

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