DOI: 10.1007/bf00901910. Evaluation of concentration-depth profiles by sputtering in SIMS and AES

Evaluation of concentration-depth profiles by sputtering in SIMS and AES

10.1007/bf00901910

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics (297)

Bibliography

Hofmann, S. (1976). Evaluation of concentration-depth profiles by sputtering in SIMS and AES. Applied Physics, 9(1), 59â66.

Authors 1

S. Hofmann (first)

References 32 Referenced 150

G.K. Wehner, G.S. Anderson: In:Handbook of Thin Film Technology McGraw Hill, New York 1970, Chapter 3 / Handbook of Thin Film Technology by G.K. Wehner (1970)
H.E. Beske: In:Quantitative Analysis with Electron Microprobes and Secondary Ion Mass Spectrometry, ed. by E. Preuss, Ber. d. KFA Jülich, Jül-Conf.8 (1973), p.249
H.W.Werner: In:Quant. Analysis with EMPand SIMS, Jül-Conf.8 (1973), p. 239
A. Benninghoven: Appl. Phys.1, 3 (1973) (10.1007/BF00886799) / Appl. Phys. by A. Benninghoven (1973)
R.E. Weber: Res. Dev.23, 22 (1972) / Res. Dev. by R.E. Weber (1972)
P.W. Palmberg: J. Vac. Sci. Techn.9, 160 (1972) (10.1116/1.1316542) / J. Vac. Sci. Techn. by P.W. Palmberg (1972)
H.W. Werner: Dev. Appl. Spectr. Vol. 7A, 239 (1969) (10.1007/978-1-4684-8700-8_17) / Dev. Appl. Spectr. by H.W. Werner (1969)
H.W. Werner: Vacuum24, 493 (1974) (10.1016/0042-207X(74)90016-5) / Vacuum by H.W. Werner (1974)
H. Liebl: Meßtechnik H.12, 358 (1972) / Meßtechnik H. by H. Liebl (1972)
M.L. Tarng, G.K. Wehner: J. Appl. Phys.43, 2268 (1972) (10.1063/1.1661490) / J. Appl. Phys. by M.L. Tarng (1972)
G. Carter, J.S. Colligon:Ion Bombardment of Solids (Heinemann, London 1968) / Ion Bombardment of Solids by G. Carter (1968)
P. Sigmund: J. Mat. Sci.8, 1545 (1973) (10.1007/BF00754888) / J. Mat. Sci. by P. Sigmund (1973)
A. Benninghoven: Z. Physik.230, 403 (1970) (10.1007/BF01394486) / Z. Physik. by A. Benninghoven (1970)
F. Schulz, K. Wittmaack, J. Maul: Rad. Effects18, 211 (1973) (10.1080/00337577308232124) / Rad. Effects by F. Schulz (1973)
S.D. Dahlgren, E.D. McClanahan: J. Appl. Phys.43, 1514 (1972) (10.1063/1.1661352) / J. Appl. Phys. by S.D. Dahlgren (1972)
M.L. Tarng, G.K. Wehner: J. Appl. Phys.42, 2449 (1971) (10.1063/1.1660561) / J. Appl. Phys. by M.L. Tarng (1971)
A. Benninghoven: Z. Naturforsch.22a, 841 (1967) (10.1515/zna-1967-0540) / Z. Naturforsch. by A. Benninghoven (1967)
V. Leroy, J.-P. Servais, L. Habraken: C. Res. Met.35 (6), 69 (1973) / C. Res. Met. by V. Leroy (1973)
C.A. Andersen: Int. J. Mass Spectr. Ion Phys.2, 61 (1969) (10.1016/0020-7381(69)80006-9) / Int. J. Mass Spectr. Ion Phys. by C.A. Andersen (1969)
H.W. Werner, H.A.M. De Grefte: Surf. Sci.35, 458 (1973) (10.1016/0039-6028(73)90233-1) / Surf. Sci. by H.W. Werner (1973)
B.R. Martin:Statistics for Physicists (Academic Press, London 1971) / Statistics for Physicists by B.R. Martin (1971)
G.L. Squires:Practical Physics (McGraw-Hill, London 1968) / Practical Physics by G.L. Squires (1968)
K.H. Gaukler: In:Quant. Anal. with EMPand SIMS, Jül-Conf.8 (1973), p. 300
M.P. Seah: Surf. Sci.32, 703 (1972) (10.1016/0039-6028(72)90196-3) / Surf. Sci. by M.P. Seah (1972)
C.R. Brundle: J. Vac. Sci. Techn.11, 212 (1974) (10.1116/1.1318572) / J. Vac. Sci. Techn. by C.R. Brundle (1974)
C.A. Evans: Anal. Chem.44 (13), 67A (1972) / Anal. Chem. by C.A. Evans (1972)
J.M. Morabito: Anal. Chem.46, 189 (1974) (10.1021/ac60338a026) / Anal. Chem. by J.M. Morabito (1974)
S. Hofmann, H.E. Exner: Z. Metallk.65, 778 (1974) / Z. Metallk. by S. Hofmann (1974)
J. Hoffmann, S. Hofmann, L. Tillmann: Z. Metallk.65, 721 (1974) / Z. Metallk. by J. Hoffmann (1974)
S. Hofmann, L.J. Gauckler: Powder Met. Int.6, 90 (1974) / Powder Met. Int. by S. Hofmann (1974)
B. Blanchard, N. Hilleret, J.B. Quoirin: J. Radioanal. Chem.12, 85 (1972) (10.1007/BF02520978) / J. Radioanal. Chem. by B. Blanchard (1972)
F.W. Karasek: Res. Dev.24 (11), 40 (1973) / Res. Dev. by F.W. Karasek (1973)

Dates

Type	When
Created	20 years, 8 months ago (Dec. 29, 2004, 5:54 a.m.)
Deposited	5 years, 4 months ago (April 4, 2020, 9:45 p.m.)
Indexed	1 year, 3 months ago (May 11, 2024, 5:57 p.m.)
Issued	49 years, 7 months ago (Jan. 1, 1976)
Published	49 years, 7 months ago (Jan. 1, 1976)
Published Print	49 years, 7 months ago (Jan. 1, 1976)

Funders 0

None

BibTeX

@article{Hofmann_1976, title={Evaluation of concentration-depth profiles by sputtering in SIMS and AES}, volume={9}, ISSN={1432-0630}, url={http://dx.doi.org/10.1007/bf00901910}, DOI={10.1007/bf00901910}, number={1}, journal={Applied Physics}, publisher={Springer Science and Business Media LLC}, author={Hofmann, S.}, year={1976}, month=jan, pages={59–66} }

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