DOI: 10.1007/bf00614665. Photo-enhanced etching ofn-Si

10.1007/bf00614665

Crossref journal-article

Springer Science and Business Media LLC

Applied Physics A Solids and Surfaces (297)

Bibliography

Hoffmann, H. J., & Woodall, J. M. (1984). Photo-enhanced etching ofn-Si. Applied Physics A Solids and Surfaces, 33(4), 243â245.

Authors 2

H. J. Hoffmann (first)
J. M. Woodall (additional)

References 11 Referenced 7

W. Kern, Ch.A. Deckert: Chemical Etching, inThin Film Processes, ed. by J.L. Vossen and W. Kern (Academic Press, New York 1978) pp. 401?496 (10.1016/B978-0-12-728250-3.50015-5) / Thin Film Processes by W. Kern (1978)
B. Schwartz, H. Robbins: J. Electrochem. Soc.123, 1903 (1976) (10.1149/1.2132721) / J. Electrochem. Soc. by B. Schwartz (1976)
W. Kern: RCA Rev.39, 278 (1978) / RCA Rev. by W. Kern (1978)
S.M. Hu, D.R. Kerr: J. Electrochem. Soc.114, 414 (1967) (10.1149/1.2426612) / J. Electrochem. Soc. by S.M. Hu (1967)
A. Uhlir: Bell Syst. Tech. J.35, 333 (1956) (10.1002/j.1538-7305.1956.tb02385.x) / Bell Syst. Tech. J. by A. Uhlir (1956)
D.R. Turner: J. Electrochem. Soc.105, 402 (1958) (10.1149/1.2428873) / J. Electrochem. Soc. by D.R. Turner (1958)
D.R. Turner: J. Electrochem. Soc.107, 810 (1960) (10.1149/1.2427519) / J. Electrochem. Soc. by D.R. Turner (1960)
D.R. Turner:The Surface Chemistry of Metals and Semiconductors (J. Wiley, New York 1960) / The Surface Chemistry of Metals and Semiconductors by D.R. Turner (1960)
R. Memming, G. Schwandt: Surf. Sci.4, 109 (1966) (10.1016/0039-6028(66)90071-9) / Surf. Sci. by R. Memming (1966)
R.L. Meek: J. Electrochem. Soc.118, 437 (1971) (10.1149/1.2408076) / J. Electrochem. Soc. by R.L. Meek (1971)
H.J. Hoffmann, J.M. Woodall, T.I. Chappell: Appl. Phys. Lett.38, 564 (1981) (10.1063/1.92414) / Appl. Phys. Lett. by H.J. Hoffmann (1981)

Dates

Type	When
Created	20 years, 9 months ago (Nov. 25, 2004, 7:54 a.m.)
Deposited	6 years, 4 months ago (April 4, 2019, 7:43 p.m.)
Indexed	1 year, 9 months ago (Nov. 20, 2023, 2:41 p.m.)
Issued	41 years, 4 months ago (April 1, 1984)
Published	41 years, 4 months ago (April 1, 1984)
Published Print	41 years, 4 months ago (April 1, 1984)

Funders 0

None

BibTeX

@article{Hoffmann_1984, title={Photo-enhanced etching ofn-Si}, volume={33}, ISSN={1432-0630}, url={http://dx.doi.org/10.1007/bf00614665}, DOI={10.1007/bf00614665}, number={4}, journal={Applied Physics A Solids and Surfaces}, publisher={Springer Science and Business Media LLC}, author={Hoffmann, H. J. and Woodall, J. M.}, year={1984}, month=apr, pages={243–245} }

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