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Oxidation of Metals (297)
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Gelain, C., Cassuto, A., & Le Goff, P. (1971). Kinetics and mechanism of low-pressure, high-temperature oxidation of silicon-II. Oxidation of Metals, 3(2), 139–151.

Authors 3
  1. C. Gelain (first)
  2. A. Cassuto (additional)
  3. P. Le Goff (additional)
References 21 Referenced 59
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Dates
Type When
Created 20 years, 9 months ago (Nov. 24, 2004, 4:11 a.m.)
Deposited 6 years, 4 months ago (April 4, 2019, 11:22 p.m.)
Indexed 1 year, 1 month ago (July 5, 2024, 10:11 p.m.)
Issued 54 years, 5 months ago (March 1, 1971)
Published 54 years, 5 months ago (March 1, 1971)
Published Print 54 years, 5 months ago (March 1, 1971)
Funders 0

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@article{Gelain_1971, title={Kinetics and mechanism of low-pressure, high-temperature oxidation of silicon-II}, volume={3}, ISSN={1573-4889}, url={http://dx.doi.org/10.1007/bf00603483}, DOI={10.1007/bf00603483}, number={2}, journal={Oxidation of Metals}, publisher={Springer Science and Business Media LLC}, author={Gelain, C. and Cassuto, A. and Le Goff, P.}, year={1971}, month=mar, pages={139–151} }